Browsing by Author Wong, AKK

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TitleAuthor(s)Issue DateViews
 
Aberration measurement using in-situ two-beam interferometry
Proceeding/Conference:Proceedings of SPIE
2001
79
 
2001
66
 
Asymmetric biasing for subgrid pattern adjustment
Proceeding/Conference:Proceedings of SPIE
2001
61
 
2001
198
 
2009
90
2009
49
 
2004
53
 
Effects of grid-placed contacts on circuit performance
Proceeding/Conference:Proceedings of SPIE
2003
44
 
2001
65
 
Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment
Proceeding/Conference:IEEE Hong Kong Electron Devices Meeting Proceedings
2002
68
Modeling the effects of patterning error on MOSFET
Proceeding/Conference:International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT
2004
44
The nebulous hotspot and algorithm variability
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2009
61
 
Optimum mask and source patterns to print a given shape
Proceeding/Conference:Proceedings of SPIE
2001
119
 
Optimum mask and source patterns to print a given shape
Journal:Journal of Microlithography, Microfabrication, and Microsystems
2002
60
 
Placement sensitivity to aberration in optical imaging
Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits
2003
66
 
Quantification of image quality
Proceeding/Conference:SPIE - International Society for Optical Engineering. Proceedings
2002
65
 
Sensitivity of 1D mask features towards aberration in photolithography
Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
2003
41
 
Standard cell layout with grid-placed contacts
Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
2003
60
 
2002
200
 
2002
50