Showing results 1 to 20 of 21
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| Title | Author(s) | Issue Date | Views | |
|---|---|---|---|---|
Aberration measurement using in-situ two-beam interferometry Proceeding/Conference:Proceedings of SPIE | 2001 | 79 | ||
Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations Proceeding/Conference:Proceedings of SPIE | 2001 | 66 | ||
Asymmetric biasing for subgrid pattern adjustment Proceeding/Conference:Proceedings of SPIE | 2001 | 61 | ||
Characterization of linewidth variation on 248- and 193-nm exposure tools Proceeding/Conference:Proceedings of SPIE | 2001 | 198 | ||
Computation lithography: Virtual reality and virtual virtuality Journal:Optics Express | 2009 | 90 | ||
Computation lithography: Virtual reality and virtual virtuality Proceeding/Conference:ECS Transactions | 2009 | 49 | ||
| 2004 | 53 | |||
Effects of grid-placed contacts on circuit performance Proceeding/Conference:Proceedings of SPIE | 2003 | 44 | ||
| 2001 | 65 | |||
Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment Proceeding/Conference:IEEE Hong Kong Electron Devices Meeting Proceedings | 2002 | 68 | ||
Modeling the effects of patterning error on MOSFET Proceeding/Conference:International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT | 2004 | 44 | ||
The nebulous hotspot and algorithm variability Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2009 | 61 | ||
Optimum mask and source patterns to print a given shape Proceeding/Conference:Proceedings of SPIE | 2001 | 119 | ||
Optimum mask and source patterns to print a given shape Journal:Journal of Microlithography, Microfabrication, and Microsystems | 2002 | 60 | ||
Placement sensitivity to aberration in optical imaging Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits | 2003 | 66 | ||
Quantification of image quality Proceeding/Conference:SPIE - International Society for Optical Engineering. Proceedings | 2002 | 65 | ||
Sensitivity of 1D mask features towards aberration in photolithography Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | 41 | ||
Standard cell layout with grid-placed contacts Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | 60 | ||
| 2002 | 200 | |||
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks Proceeding/Conference:Proceedings of SPIE | 2002 | 50 |