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Conference Paper: Quantification of image quality

TitleQuantification of image quality
Authors
KeywordsNormalized process latitude
Normalized image log slope
Mask error factor
Chromium-on-glass (COG)
Aberrations
Issue Date2002
PublisherSPIE - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Citation
Optical microlithography XV, Santa Clara, CA., 5-8 March 2002. In SPIE - International Society for Optical Engineering Proceedings, 2002, v. 4691, p. 169-178 How to Cite?
AbstractTraditionally, the common window method is used to quantify image quality in optical lithography. The common window method can take dose variation. focus error, mask critical dimension error and aberrations into account. However, the demerit of the common window method is its computation time. In this paper, a new metric called Normalized Process Latitude (NPL) is proposed. The NPL considers dose variation, focus error, mask critical dimension error and aberrations to output its fmal quantification value. Its processing time for quantifying one feature is usually within 10 seconds on a PC with 1GHz CPU and 256MB DRAM. We perform several comparisons between the total window value and the NPL. It is found that the NPL draws similar conclusion as the total window. We can conclude that NPL is a sensible figure ofmerit for image quantification.
Persistent Identifierhttp://hdl.handle.net/10722/46316
ISSN
References

 

DC FieldValueLanguage
dc.contributor.authorPong, WTen_HK
dc.contributor.authorWong, AKKen_HK
dc.date.accessioned2007-10-30T06:47:12Z-
dc.date.available2007-10-30T06:47:12Z-
dc.date.issued2002en_HK
dc.identifier.citationOptical microlithography XV, Santa Clara, CA., 5-8 March 2002. In SPIE - International Society for Optical Engineering Proceedings, 2002, v. 4691, p. 169-178en_HK
dc.identifier.issn0277-786Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/46316-
dc.description.abstractTraditionally, the common window method is used to quantify image quality in optical lithography. The common window method can take dose variation. focus error, mask critical dimension error and aberrations into account. However, the demerit of the common window method is its computation time. In this paper, a new metric called Normalized Process Latitude (NPL) is proposed. The NPL considers dose variation, focus error, mask critical dimension error and aberrations to output its fmal quantification value. Its processing time for quantifying one feature is usually within 10 seconds on a PC with 1GHz CPU and 256MB DRAM. We perform several comparisons between the total window value and the NPL. It is found that the NPL draws similar conclusion as the total window. We can conclude that NPL is a sensible figure ofmerit for image quantification.en_HK
dc.format.extent947381 bytes-
dc.format.extent5278 bytes-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypetext/plain-
dc.languageengen_HK
dc.publisherSPIE - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedingsen_HK
dc.relation.ispartofSPIE - International Society for Optical Engineering. Proceedings-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rightsSPIE - the International Society for Optical Proceedings. Copyright © SPIE - International Society for Optical Engineering.en_HK
dc.rightsCopyright 2002 Society of Photo-Optical Instrumentation Engineers. This paper was published in Optical microlithography XV, Santa Clara, USA, 5-8 March 2002, v. 4691, p. 169-178 and is made available as an electronic reprint with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.en_HK
dc.subjectNormalized process latitudeen_HK
dc.subjectNormalized image log slopeen_HK
dc.subjectMask error factoren_HK
dc.subjectChromium-on-glass (COG)en_HK
dc.subjectAberrationsen_HK
dc.titleQuantification of image qualityen_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0277-786X&volume=4691&spage=169&epage=178&date=2002&atitle=Quantification+of+image+qualityen_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1117/12.474529en_HK
dc.identifier.scopuseid_2-s2.0-0036413061-
dc.identifier.hkuros71753-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0036413061&selection=ref&src=s&origin=recordpage-
dc.identifier.volume4691-
dc.identifier.spage169-
dc.identifier.epage178-
dc.customcontrol.immutablesml 160112 - amend-

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