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Article: Computation lithography: Virtual reality and virtual virtuality

TitleComputation lithography: Virtual reality and virtual virtuality
Authors
KeywordsPhotolithography
Microlithography
Computational imaging
Issue Date2009
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2009, v. 17 n. 15, p. 12259-12268 How to Cite?
AbstractComputation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. Examples under consideration include design-for- manufacturability and inverse lithography. © 2009 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/62090
ISSN
2015 Impact Factor: 3.148
2015 SCImago Journal Rankings: 2.186
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorLam, EYen_HK
dc.contributor.authorWong, AKKen_HK
dc.date.accessioned2010-07-13T03:53:41Z-
dc.date.available2010-07-13T03:53:41Z-
dc.date.issued2009en_HK
dc.identifier.citationOptics Express, 2009, v. 17 n. 15, p. 12259-12268en_HK
dc.identifier.issn1094-4087en_HK
dc.identifier.urihttp://hdl.handle.net/10722/62090-
dc.description.abstractComputation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. Examples under consideration include design-for- manufacturability and inverse lithography. © 2009 Optical Society of America.en_HK
dc.languageengen_HK
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.orgen_HK
dc.relation.ispartofOptics Expressen_HK
dc.rightsOptics Express. Copyright © Optical Society of America.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rightsThis paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/abstract.cfm?uri=oe-17-15-12259. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.-
dc.subjectPhotolithography-
dc.subjectMicrolithography-
dc.subjectComputational imaging-
dc.subject.meshAlgorithmsen_HK
dc.subject.meshComputer Simulationen_HK
dc.subject.meshEquipment Designen_HK
dc.subject.meshModels, Statisticalen_HK
dc.subject.meshModels, Theoreticalen_HK
dc.subject.meshOptics and Photonicsen_HK
dc.subject.meshPhysics - methodsen_HK
dc.titleComputation lithography: Virtual reality and virtual virtualityen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1094-4087&volume=17&issue=15&spage=12259–12268&epage=&date=2009&atitle=Computation+lithography:+virtual+reality+and+virtual+virtuality-
dc.identifier.emailLam, EY:elam@eee.hku.hken_HK
dc.identifier.authorityLam, EY=rp00131en_HK
dc.description.naturepostprint-
dc.identifier.doi10.1364/OE.17.012259en_HK
dc.identifier.pmid19654627-
dc.identifier.scopuseid_2-s2.0-67749116249en_HK
dc.identifier.hkuros171659en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-67749116249&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume17en_HK
dc.identifier.issue15en_HK
dc.identifier.spage12259en_HK
dc.identifier.epage12268en_HK
dc.identifier.isiWOS:000268399500006-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridLam, EY=7102890004en_HK
dc.identifier.scopusauthoridWong, AKK=7403147663en_HK
dc.identifier.citeulike9791778-

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