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Conference Paper: Sensitivity of 1D mask features towards aberration in photolithography

TitleSensitivity of 1D mask features towards aberration in photolithography
Authors
Mak, GYHWong, AKKLam, EYM
Issue Date2003
Citation
Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference, p. 129-130 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/99195

 

DC FieldValueLanguage
dc.contributor.authorMak, GYHen_HK
dc.contributor.authorWong, AKKen_HK
dc.contributor.authorLam, EYMen_HK
dc.date.accessioned2010-09-25T18:19:42Z-
dc.date.available2010-09-25T18:19:42Z-
dc.date.issued2003en_HK
dc.identifier.citationRegional Inter-University Postgraduate Electrical and Electronic Engineering Conference, p. 129-130en_HK
dc.identifier.urihttp://hdl.handle.net/10722/99195-
dc.languageengen_HK
dc.relation.ispartofRegional Inter-University Postgraduate Electrical and Electronic Engineering Conferenceen_HK
dc.titleSensitivity of 1D mask features towards aberration in photolithographyen_HK
dc.typeConference_Paperen_HK
dc.identifier.emailMak, GYH: giuseppe@graduate.hku.hken_HK
dc.identifier.emailWong, AKK: awong@eee.hku.hken_HK
dc.identifier.emailLam, EYM: elam@eee.hku.hken_HK
dc.identifier.authorityLam, EYM=rp00131en_HK
dc.identifier.hkuros88830en_HK
dc.identifier.spage129en_HK
dc.identifier.epage130en_HK

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