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Conference Paper: Effects of grid-placed contacts on circuit performance
Title | Effects of grid-placed contacts on circuit performance |
---|---|
Authors | |
Keywords | Resolution enhancement techniques Grid-placed contacts Standard cells Double exposure Critical dimension |
Issue Date | 2003 |
Publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings |
Citation | Cost and Performance in Integrated Circuit Creation, Santa Clara, California, USA, 27-28 February 2003. In Proceedings of SPIE, 2003, v. 5043, p. 134-141 How to Cite? |
Abstract | The impact of grid-placed contacts on application-specific integrated circuit (ASIC) performance is studied. Although snapping contacts to grid adds restrictions during layout design, smaller circuit area can be achieved by careful selection of the grid pitch, raising the lower limit of transistor width, applying double exposure, and shrinking the minimum contact pitch enabled by more effective application of resolution enhancement technologies. The technique is demonstrated on the contact level of 250-nm standard cells with the minimum contact pitch shrunk by 10%. The area change of 84 cells ranges from -20% to 25% with a median decrease of 5%. The areas of two circuits, a finite-impulse-response (FIR) filter and an add-compare-select (ACS) unit in the Viterbi decoder, decrease by 4% and 2% respectively. Delay and power consumption are also estimated to decrease with area. |
Persistent Identifier | http://hdl.handle.net/10722/46396 |
ISSN | 2023 SCImago Journal Rankings: 0.152 |
DC Field | Value | Language |
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dc.contributor.author | Wang, J | en_HK |
dc.contributor.author | Wong, AKK | en_HK |
dc.date.accessioned | 2007-10-30T06:48:58Z | - |
dc.date.available | 2007-10-30T06:48:58Z | - |
dc.date.issued | 2003 | en_HK |
dc.identifier.citation | Cost and Performance in Integrated Circuit Creation, Santa Clara, California, USA, 27-28 February 2003. In Proceedings of SPIE, 2003, v. 5043, p. 134-141 | - |
dc.identifier.issn | 0277-786X | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/46396 | - |
dc.description.abstract | The impact of grid-placed contacts on application-specific integrated circuit (ASIC) performance is studied. Although snapping contacts to grid adds restrictions during layout design, smaller circuit area can be achieved by careful selection of the grid pitch, raising the lower limit of transistor width, applying double exposure, and shrinking the minimum contact pitch enabled by more effective application of resolution enhancement technologies. The technique is demonstrated on the contact level of 250-nm standard cells with the minimum contact pitch shrunk by 10%. The area change of 84 cells ranges from -20% to 25% with a median decrease of 5%. The areas of two circuits, a finite-impulse-response (FIR) filter and an add-compare-select (ACS) unit in the Viterbi decoder, decrease by 4% and 2% respectively. Delay and power consumption are also estimated to decrease with area. | en_HK |
dc.format.extent | 700985 bytes | - |
dc.format.extent | 5278 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | text/plain | - |
dc.language | eng | en_HK |
dc.publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings | en_HK |
dc.relation.ispartof | Proceedings of SPIE | - |
dc.rights | Copyright 2003 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/12.485279 | - |
dc.subject | Resolution enhancement techniques | en_HK |
dc.subject | Grid-placed contacts | en_HK |
dc.subject | Standard cells | en_HK |
dc.subject | Double exposure | en_HK |
dc.subject | Critical dimension | en_HK |
dc.title | Effects of grid-placed contacts on circuit performance | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0277-786X&volume=5043&spage=134&epage=141&date=2003&atitle=Effects+of+grid-placed+contacts+on+circuit+performance | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1117/12.485279 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0038398093 | - |
dc.identifier.hkuros | 82560 | - |
dc.identifier.issnl | 0277-786X | - |