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Conference Paper: The nebulous hotspot and algorithm variability

TitleThe nebulous hotspot and algorithm variability
Authors
Wong, AKKLam, EY
KeywordsAlgorithm variability
Computation lithography
Hotspot
LPC
Issue Date2009
PublisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
Citation
Proceedings Of Spie - The International Society For Optical Engineering, 2009, v. 7275 How to Cite?
DOI: http://dx.doi.org/10.1117/12.816449
AbstractComputation lithography relies on algorithms. These algorithms exhibit variability that can be as much as 5% (1 σ) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application. © 2009 SPIE.
DescriptionDesign for Manufacturability through Design-Process Integration, volume 7275 of Proceedings of the SPIE
Persistent Identifierhttp://hdl.handle.net/10722/62071
ISSN
0277-786X
2020 SCImago Journal Rankings: 0.192
ISI Accession Number ID
WOS:000292150300004
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorWong, AKKen_HK
dc.contributor.authorLam, EYen_HK
dc.date.accessioned2010-07-13T03:53:18Z-
dc.date.available2010-07-13T03:53:18Z-
dc.date.issued2009en_HK
dc.identifier.citationProceedings Of Spie - The International Society For Optical Engineering, 2009, v. 7275en_HK
dc.identifier.issn0277-786Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/62071-
dc.descriptionDesign for Manufacturability through Design-Process Integration, volume 7275 of Proceedings of the SPIEen_HK
dc.description.abstractComputation lithography relies on algorithms. These algorithms exhibit variability that can be as much as 5% (1 σ) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application. © 2009 SPIE.en_HK
dc.languageengen_HK
dc.publisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xmlen_HK
dc.relation.ispartofProceedings of SPIE - The International Society for Optical Engineeringen_HK
dc.subjectAlgorithm variabilityen_HK
dc.subjectComputation lithographyen_HK
dc.subjectHotspoten_HK
dc.subjectLPCen_HK
dc.titleThe nebulous hotspot and algorithm variabilityen_HK
dc.typeConference_Paperen_HK
dc.identifier.emailLam, EY:elam@eee.hku.hken_HK
dc.identifier.authorityLam, EY=rp00131en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1117/12.816449en_HK
dc.identifier.scopuseid_2-s2.0-66749100285en_HK
dc.identifier.hkuros158741en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-66749100285&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume7275en_HK
dc.identifier.isiWOS:000292150300004-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridWong, AKK=7403147663en_HK
dc.identifier.scopusauthoridLam, EY=7102890004en_HK
dc.identifier.issnl0277-786X-

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