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Conference Paper: Computation lithography: Virtual reality and virtual virtuality

TitleComputation lithography: Virtual reality and virtual virtuality
Authors
Wong, AKKLam, EY
Issue Date2009
Citation
Ecs Transactions, 2009, v. 18 n. 1 PART 1, p. 351-356 How to Cite?
DOI: http://dx.doi.org/10.1149/1.3096471
AbstractComputation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. ©The Electrochemical Society.
Persistent Identifierhttp://hdl.handle.net/10722/158630
ISSN
1938-5862
2020 SCImago Journal Rankings: 0.235
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorWong, AKKen_US
dc.contributor.authorLam, EYen_US
dc.date.accessioned2012-08-08T09:00:33Z-
dc.date.available2012-08-08T09:00:33Z-
dc.date.issued2009en_US
dc.identifier.citationEcs Transactions, 2009, v. 18 n. 1 PART 1, p. 351-356en_US
dc.identifier.issn1938-5862en_US
dc.identifier.urihttp://hdl.handle.net/10722/158630-
dc.description.abstractComputation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. ©The Electrochemical Society.en_US
dc.languageengen_US
dc.relation.ispartofECS Transactionsen_US
dc.titleComputation lithography: Virtual reality and virtual virtualityen_US
dc.typeConference_Paperen_US
dc.identifier.emailLam, EY:elam@eee.hku.hken_US
dc.identifier.authorityLam, EY=rp00131en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1149/1.3096471en_US
dc.identifier.scopuseid_2-s2.0-77950652340en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-77950652340&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume18en_US
dc.identifier.issue1 PART 1en_US
dc.identifier.spage351en_US
dc.identifier.epage356en_US
dc.identifier.scopusauthoridWong, AKK=7403147663en_US
dc.identifier.scopusauthoridLam, EY=7102890004en_US
dc.identifier.issnl1938-5862-

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