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Conference Paper: Computation lithography: Virtual reality and virtual virtuality
Title | Computation lithography: Virtual reality and virtual virtuality |
---|---|
Authors | |
Issue Date | 2009 |
Citation | Ecs Transactions, 2009, v. 18 n. 1 PART 1, p. 351-356 How to Cite? |
Abstract | Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. ©The Electrochemical Society. |
Persistent Identifier | http://hdl.handle.net/10722/158630 |
ISSN | 2020 SCImago Journal Rankings: 0.235 |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wong, AKK | en_US |
dc.contributor.author | Lam, EY | en_US |
dc.date.accessioned | 2012-08-08T09:00:33Z | - |
dc.date.available | 2012-08-08T09:00:33Z | - |
dc.date.issued | 2009 | en_US |
dc.identifier.citation | Ecs Transactions, 2009, v. 18 n. 1 PART 1, p. 351-356 | en_US |
dc.identifier.issn | 1938-5862 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/158630 | - |
dc.description.abstract | Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. ©The Electrochemical Society. | en_US |
dc.language | eng | en_US |
dc.relation.ispartof | ECS Transactions | en_US |
dc.title | Computation lithography: Virtual reality and virtual virtuality | en_US |
dc.type | Conference_Paper | en_US |
dc.identifier.email | Lam, EY:elam@eee.hku.hk | en_US |
dc.identifier.authority | Lam, EY=rp00131 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1149/1.3096471 | en_US |
dc.identifier.scopus | eid_2-s2.0-77950652340 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-77950652340&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.volume | 18 | en_US |
dc.identifier.issue | 1 PART 1 | en_US |
dc.identifier.spage | 351 | en_US |
dc.identifier.epage | 356 | en_US |
dc.identifier.scopusauthorid | Wong, AKK=7403147663 | en_US |
dc.identifier.scopusauthorid | Lam, EY=7102890004 | en_US |
dc.identifier.issnl | 1938-5862 | - |