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Conference Paper: Aberration measurement using in-situ two-beam interferometry

TitleAberration measurement using in-situ two-beam interferometry
Authors
Keywordsaberrations
blazed gratings
two beam interferometry
lens stability
surface relief images
Issue Date2001
PublisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Citation
Optical microlithography XIV, Santa Clara, USA, 27 February - 2 March 2001, v. 4346, p. 8-14 How to Cite?
AbstractA reticle with phase-only blazed gratings ofvaiying azimuthal orientations diffracts light into only two orders, 0 & +1, discretely illuminating a lens pupil. The image ofeach grating is a sinusoidal interference pattern and is recorded as a surface relief in a highly absorbing photoresist. The maximum image contrast occurs when focus is set such that the RMS wavefront error over the two beams is minimized. This maximum contrast vs focus is recorded by a CCD array mounted on a dark-field optical microscope and the aberrations are obtained from an analysis of this record. Repeatability of equivalent primary aberrations ofless than O.OO17RMS are achieved and used to monitor lens stability.
Persistent Identifierhttp://hdl.handle.net/10722/46227
ISSN

 

DC FieldValueLanguage
dc.contributor.authorKirk, JPen_HK
dc.contributor.authorKunkel, Gen_HK
dc.contributor.authorWong, AKKen_HK
dc.date.accessioned2007-10-30T06:45:13Z-
dc.date.available2007-10-30T06:45:13Z-
dc.date.issued2001en_HK
dc.identifier.citationOptical microlithography XIV, Santa Clara, USA, 27 February - 2 March 2001, v. 4346, p. 8-14en_HK
dc.identifier.issn0277-786Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/46227-
dc.description.abstractA reticle with phase-only blazed gratings ofvaiying azimuthal orientations diffracts light into only two orders, 0 & +1, discretely illuminating a lens pupil. The image ofeach grating is a sinusoidal interference pattern and is recorded as a surface relief in a highly absorbing photoresist. The maximum image contrast occurs when focus is set such that the RMS wavefront error over the two beams is minimized. This maximum contrast vs focus is recorded by a CCD array mounted on a dark-field optical microscope and the aberrations are obtained from an analysis of this record. Repeatability of equivalent primary aberrations ofless than O.OO17RMS are achieved and used to monitor lens stability.en_HK
dc.format.extent317131 bytes-
dc.format.extent5278 bytes-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypetext/plain-
dc.languageengen_HK
dc.publisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedingsen_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rightsS P I E - the International Society for Optical Proceedings. Copyright © S P I E - International Society for Optical Engineering.en_HK
dc.rightsCopyright 2001 Society of Photo-Optical Instrumentation Engineers.This paper was published in Optical microlithography XIV, Santa Clara, USA, 27 February - 2 March 2001, v. 4346, p. 8-14 and is madeavailable as an electronic reprint with permission of SPIE. One print or electronic copy may bemade for personal use only. Systematic or multiple reproduction, distribution to multiple locations viaelectronic or other means, duplication of any material in this paper for a fee or for commercial purposes,or modification of the content of the paper are prohibited.en_HK
dc.subjectaberrationsen_HK
dc.subjectblazed gratingsen_HK
dc.subjecttwo beam interferometryen_HK
dc.subjectlens stabilityen_HK
dc.subjectsurface relief imagesen_HK
dc.titleAberration measurement using in-situ two-beam interferometryen_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0277-786X&volume=4346&spage=8&epage=14&date=2001&atitle=Aberration+measurement+using+in-situ+two-beam+interferometryen_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1117/12.435717en_HK
dc.identifier.scopuseid_2-s2.0-0035759407-
dc.identifier.hkuros58717-

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