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Title	Author(s)	Issue Date	Views
Aberration measurement using in-situ two-beam interferometry Proceeding/Conference:Proceedings of SPIE	Kirk, JP Kunkel, G Wong, AKK	2001	115
Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations Proceeding/Conference:Proceedings of SPIE	Wong, AKK Liebmann, LW Molless, AF	2001	163
Asymmetric biasing for subgrid pattern adjustment Proceeding/Conference:Proceedings of SPIE	Wong, AKK Liebmann, LW	2001	127
Characterization of linewidth variation on 248- and 193-nm exposure tools Proceeding/Conference:Proceedings of SPIE	Gabor, A Brunner, T Chen, J Chen, N Deshpande, S Ferguson, R Horak, DV Holmes, S Liebmann, L Mansfield, S Molless, A Progler, CJ Rabidoux, R Ryan, D Talvi, P Tsou, L Vampatella, B Wong, AKK Yang, Q Yu, CF	2001	184
Computation lithography: Virtual reality and virtual virtuality Proceeding/Conference:ECS Transactions	Wong, AKK Lam, EY	2009	120
Computation lithography: Virtual reality and virtual virtuality Journal:Optics Express	Lam, EY Wong, AKK	2009	295
Designing of precomputational-based low-power Viterbi decoder	Yang, JL Wong, AKK	2004	108
Effects of grid-placed contacts on circuit performance Proceeding/Conference:Proceedings of SPIE	Wang, J Wong, AKK	2003	113
Effects of mismatch on CMOS double-balanced mixers: a theoreticalanalysis	Wang, J Wong, AKK	2001	110
Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment Proceeding/Conference:IEEE Hong Kong Electron Devices Meeting Proceedings	Pong, WT Wong, AKK	2002
Modeling the effects of patterning error on MOSFET Proceeding/Conference:International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT	Pun, CH Lai, PT Wong, AKK	2004	107
The nebulous hotspot and algorithm variability Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering	Wong, AKK Lam, EY	2009
Optimum mask and source patterns to print a given shape Journal:Journal of Microlithography, Microfabrication, and Microsystems	Rosenbluth, AE Bukofsky, S Fonseca, S Hibbs, M Lai, K Molless, A Singh, RN Wong, AKK	2002	130
Optimum mask and source patterns to print a given shape Proceeding/Conference:Proceedings of SPIE	Rosenbluth, AE Bukofsky, SJ Hibbs, MS Lai, K Molless, AF Singh, RN Wong, AKK	2001
Placement sensitivity to aberration in optical imaging Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits	Mak, GYH Lam, EYM Wong, AKK	2003	144
Quantification of image quality Proceeding/Conference:SPIE - International Society for Optical Engineering. Proceedings	Pong, WT Wong, AKK	2002
Sensitivity of 1D mask features towards aberration in photolithography Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference	Mak, GYH Wong, AKK Lam, EYM	2003
Standard cell layout with grid-placed contacts Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference	Wang, J Wong, AKK Lam, EYM	2003
A study on theoretical representation of intermodulation in CMOS balanced mixers	Wang, J Wong, AKK	2002	108
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks Proceeding/Conference:Proceedings of SPIE	Wong, AKK	2002	112

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