Browsing by Author rp00197

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TitleAuthor(s)Issue Date
 
Low-voltage polymer thin-film transistors with high-k HfTiO gate dielectric annealed in NH3 or N2
Proceeding/Conference:2009 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2009
Deng, LFChoi, HWLai, PTLiu, YRXu, JP
2009
 
Mechanism analysis of gate-induced drain leakage in off-state n-MOSFET
Journal:Microelectronics Reliability
Huang, LLai, PTXu, JPCheng, YC
1998
 
Mechanism analysis of gate-induced drain leakage in off-state n-MOSFET
Proceeding/Conference:Proceedings of the IEEE Hong Kong Electron Devices Meeting
Huang, LLai, PTXu, JPCheng, YC
1997
 
Mechanism of GIDL degradation induced by hot-carrier stresses in n-MOSFETs
Journal:Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
Xu, JingpingLai, PT
1999
 
Mechanisms of gate-induced drain leakage in n-MOSFET's
Journal:Microelectronics Reliability
Huang, LLai, PTXu, JPCheng, YC
1998
 
Modeling of scattering at high-k dielectric/SiO2 interface of strained SiGe MOSFETs
Proceeding/Conference:ICSICT-2006: 2006 8th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
Zhang, XFXu, JPLai, PTZou, XLi, CX
2007
 
New observation and improvement in GIDL of n-MOSFETs with various kinds of N2O-based gate oxides under hot-carrier stress
Journal:Solid-State Electronics
Lai, PTXu, JZeng, XCheng, YC
1996
 
Nitrided HfTiON/Ga2O3 (Gd2O3) as stacked gate dielectric for GaAs MOS applications
Journal:Applied Physics Express
Wang, LSXu, JLiu, LTang, WMLai, PT
2014
 
Nitrided SrTiO 3 as charge-trapping layer for nonvolatile memory applications
Journal:Applied Physics Letters
Huang, XDLai, PTLiu, LXu, JP
2011
 
A novel MONOS memory with high-κ HfLaON as charge-storage layer
Journal:IEEE Transactions on Device and Materials Reliability
Liu, LXu, JPJi, FHuang, XDLai, PT
2011
 
Off-state gate current with quasi-zero temperature coefficient in n-MOSFETs with reoxidized nitrided oxide as gate dielectric
Journal:Microelectronics Reliability
Lai, PTXu, JPLo, HBCheng, YC
1998
 
Optimization of N content for higk-k LaTiON gate dielectric of Ge MOS capacitor
Proceeding/Conference:2009 IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2009
Xu, HXXu, JPLi, CXLiu, LLai, PTChan, CL
2009
 
Parallel and collective analysis of cDNA expression pattern of inflamatory related factors
Proceeding/Conference:Technical Digest of 2000 International Forum on Biochip Technologies
Zhou, WLYang, YZZhu, KLHuang, WXu, JYu, ZWLai, PTCheng, YC
2000
 
Pentacene thin-film transistors with HfO2 gate dielectric annealed in NH3 or N2O
Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits Proceedings
Deng, LFTang, WMLeung, CHLai, PTXu, JPChe, CM
2008
 
Performance Improvements of Metal–Oxide–Nitride–Oxide–Silicon Nonvolatile Memory with ZrO2 Charge-Trapping Layer by Using Nitrogen Incorporation
Journal:Applied Physics Express
Chen, JXXu, JLiu, LLai, PT
2013
 
A physical model on scattering at high-κ dielectric/SiO2 interface of SiGe p-MOSFETs
Journal:IEEE Transactions on Electron Devices
Zhang, XFXu, JPLai, PTLi, CX
2007
 
Plasma-nitrided Ga2O3(Gd2O3) as interfacial passivation layer for InGaAs metal-oxide-semiconductor capacitor with HfTiON gate dielectric
Journal:IEEE Transactions on Electron Devices
Wang, LSXu, JLiu, LLu, HLai, PTTang, WM
2015
 
Preparation of high-quality gate dielectrics for Ge MOSFET's in wet ambients
Proceeding/Conference:Proceedings of the International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2006
Lai, PTXu, JPLi, CXZou, XChen, WB
2007
 
Quality improvement of low-pressure chemical-vapor-deposited oxide by N2O nitridation
Journal:Applied Physics Letters
Lai, PTXu, JLo, HBCheng, YC
1997
 
Sensing characteristics of a novel NH 3-nitrided schottky-diode hydrogen sensor
Proceeding/Conference:IEEE International Symposium on Industrial Electronics
Tang, WMLai, PTXu, JPChan, CL
2004
Showing results 77 to 96 of 109 < previous   next >