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Conference Paper: Sensing characteristics of a novel NH 3-nitrided schottky-diode hydrogen sensor
Title | Sensing characteristics of a novel NH 3-nitrided schottky-diode hydrogen sensor |
---|---|
Authors | |
Issue Date | 2004 |
Publisher | IEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/conhome.jsp?punumber=1000354 |
Citation | Ieee International Symposium On Industrial Electronics, 2004, v. 1, p. 43-47 How to Cite? |
Abstract | A novel NHi-nitrided Schottky-diode hydrogen sensor has been successfully fabricated Measurements have been performed to investigate the sensitivity, stability and response speed of the sensor at different temperatures and hydrogen concentrations. It can respond to hydrogen variation very quickly and can give significant response ewn at low hydrogen concentration. The studied device exhibits high sensitivity of 350 % at 300 °C when 800 ppm IJ in N2 gas is introduced. The sensitivity is 15 times greater than that of the Pt-SiC sensor. The excellent hydrogen-sensing characteristics of this novel sensor make it very suitable for detecting hydrogen leakage in high-temperature environment. The effects of hydrogen adsorption on the barrier height and hydrogen reaction kinetics are also investigated. ©2004 IEEE. |
Persistent Identifier | http://hdl.handle.net/10722/46504 |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Tang, WM | en_HK |
dc.contributor.author | Lai, PT | en_HK |
dc.contributor.author | Xu, JP | en_HK |
dc.contributor.author | Chan, CL | en_HK |
dc.date.accessioned | 2007-10-30T06:51:27Z | - |
dc.date.available | 2007-10-30T06:51:27Z | - |
dc.date.issued | 2004 | en_HK |
dc.identifier.citation | Ieee International Symposium On Industrial Electronics, 2004, v. 1, p. 43-47 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/46504 | - |
dc.description.abstract | A novel NHi-nitrided Schottky-diode hydrogen sensor has been successfully fabricated Measurements have been performed to investigate the sensitivity, stability and response speed of the sensor at different temperatures and hydrogen concentrations. It can respond to hydrogen variation very quickly and can give significant response ewn at low hydrogen concentration. The studied device exhibits high sensitivity of 350 % at 300 °C when 800 ppm IJ in N2 gas is introduced. The sensitivity is 15 times greater than that of the Pt-SiC sensor. The excellent hydrogen-sensing characteristics of this novel sensor make it very suitable for detecting hydrogen leakage in high-temperature environment. The effects of hydrogen adsorption on the barrier height and hydrogen reaction kinetics are also investigated. ©2004 IEEE. | en_HK |
dc.format.extent | 728058 bytes | - |
dc.format.extent | 2174 bytes | - |
dc.format.extent | 6324 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | text/plain | - |
dc.format.mimetype | text/plain | - |
dc.language | eng | en_HK |
dc.publisher | IEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/conhome.jsp?punumber=1000354 | en_HK |
dc.relation.ispartof | IEEE International Symposium on Industrial Electronics | en_HK |
dc.rights | ©2004 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. | - |
dc.title | Sensing characteristics of a novel NH 3-nitrided schottky-diode hydrogen sensor | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.email | Lai, PT: laip@eee.hku.hk | en_HK |
dc.identifier.email | Xu, JP: jpxu@eee.hku.hk | en_HK |
dc.identifier.authority | Lai, PT=rp00130 | en_HK |
dc.identifier.authority | Xu, JP=rp00197 | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1109/ISIE.2004.1571779 | en_HK |
dc.identifier.scopus | eid_2-s2.0-66649085857 | en_HK |
dc.identifier.hkuros | 94046 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-66649085857&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 1 | en_HK |
dc.identifier.spage | 43 | en_HK |
dc.identifier.epage | 47 | en_HK |
dc.identifier.scopusauthorid | Tang, WM=24438163600 | en_HK |
dc.identifier.scopusauthorid | Lai, PT=7202946460 | en_HK |
dc.identifier.scopusauthorid | Xu, JP=7407004696 | en_HK |
dc.identifier.scopusauthorid | Chan, CL=8507083700 | en_HK |