Browsing by Author Wong, AK

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Showing results 1 to 16 of 16
TitleAuthor(s)Issue DateViews
 
Alternating phase-shifting mask design for low aberration sensitivity
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
121
 
Alternating phase-shifting mask design for low aberration sensitivity
Journal:Journal of Microlithography, Microfabrication, and Microsystems
2005
127
 
2006
103
Forbidden area avoidance with spacing technique for layout optimization
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
139
 
2008
119
 
2003
57
 
Nebulous hotspot and algorithm variability in computation lithography
Journal:Journal of Micro/Nanolithography, MEMS, and MOEMS
2010
99
 
Optimization of photomask design for reducing aberration-induced placement error
Journal:IEEE Transactions on Semiconductor Manufacturing
2006
91
 
Performance optimization for gridded-layout standard cells
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
93
 
Regularization of inverse photomask synthesis to enhance manufacturability
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2009
83
2005
99
2008
89
 
2016
66
Standard cell design with regularly-placed contacts and gates
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
74
 
Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates
Journal:Journal of Microlithography, Microfabrication, and Microsystems
2005
98
 
Standard cell layout with regular contact placement
Journal:IEEE Transactions on Semiconductor Manufacturing
2004
124