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Conference Paper: Regularization of inverse photomask synthesis to enhance manufacturability

TitleRegularization of inverse photomask synthesis to enhance manufacturability
Authors
KeywordsIntervention scheme
Inverse lithography
Mask manufacturability
MRC
Regularization on edge
Issue Date2009
PublisherSPIE - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
Citation
The SPIE Lithography Asia 2009, Taipei, Taiwan, 18 November 2009. in Proceedings of SPIE, 2009, v. 7520, p. 1-11, article no. 75200E How to Cite?
AbstractMask manufacturability has been considered as a major issue in the adoption of inverse lithography (IL) in practice. With smaller technology nodes, IL distorts the mask pattern more aggressively. The distorted mask often contains curvilinear contour and irregular shapes, which cast a heavy computation burden on segmentation and data preparation. Total variation (TV) has been used for regularization in previous work, but it is not very effective in regulating the mask shape to be rectangular. In this paper, we apply TV regularization not only on the mask image but also on the mask edges, which forces the curves of edges to be more vertical or horizontal, because they give smaller TV values. Except for rectilinearity, a group of geometrical specifications of the mask pattern set by mask manufacture rule control (MRC) is also important for mask manufacturability. To prevent these characteristics from appearing, we also propose an intervention scheme into the optimization framework. © 2009 Copyright SPIE - The International Society for Optical Engineering.
Persistent Identifierhttp://hdl.handle.net/10722/126066
ISSN
References

 

DC FieldValueLanguage
dc.contributor.authorJia, Nen_HK
dc.contributor.authorWong, AKen_HK
dc.contributor.authorLam, EYen_HK
dc.date.accessioned2010-10-31T12:07:57Z-
dc.date.available2010-10-31T12:07:57Z-
dc.date.issued2009en_HK
dc.identifier.citationThe SPIE Lithography Asia 2009, Taipei, Taiwan, 18 November 2009. in Proceedings of SPIE, 2009, v. 7520, p. 1-11, article no. 75200Een_HK
dc.identifier.issn0277-786Xen_HK
dc.identifier.urihttp://hdl.handle.net/10722/126066-
dc.description.abstractMask manufacturability has been considered as a major issue in the adoption of inverse lithography (IL) in practice. With smaller technology nodes, IL distorts the mask pattern more aggressively. The distorted mask often contains curvilinear contour and irregular shapes, which cast a heavy computation burden on segmentation and data preparation. Total variation (TV) has been used for regularization in previous work, but it is not very effective in regulating the mask shape to be rectangular. In this paper, we apply TV regularization not only on the mask image but also on the mask edges, which forces the curves of edges to be more vertical or horizontal, because they give smaller TV values. Except for rectilinearity, a group of geometrical specifications of the mask pattern set by mask manufacture rule control (MRC) is also important for mask manufacturability. To prevent these characteristics from appearing, we also propose an intervention scheme into the optimization framework. © 2009 Copyright SPIE - The International Society for Optical Engineering.en_HK
dc.languageengen_HK
dc.publisherSPIE - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xmlen_HK
dc.relation.ispartofProceedings of SPIE - The International Society for Optical Engineeringen_HK
dc.rightsProceedings of SPIE - The International Society for Optical Engineering. Copyright © Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectIntervention schemeen_HK
dc.subjectInverse lithographyen_HK
dc.subjectMask manufacturabilityen_HK
dc.subjectMRCen_HK
dc.subjectRegularization on edgeen_HK
dc.titleRegularization of inverse photomask synthesis to enhance manufacturabilityen_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=9780819479099&volume=7520&spage=&epage=&date=2009&atitle=Regularization+of+inverse+photomask+synthesis+to+enhance+manufacturability-
dc.identifier.emailLam, EY:elam@eee.hku.hken_HK
dc.identifier.authorityLam, EY=rp00131en_HK
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1117/12.837512en_HK
dc.identifier.scopuseid_2-s2.0-73949142487en_HK
dc.identifier.hkuros171693en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-73949142487&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume7520en_HK
dc.identifier.spage1-
dc.identifier.epage11-
dc.publisher.placeUnited Statesen_HK
dc.description.otherThe SPIE Lithography Asia 2009, Taipei, Taiwan, 18 November 2009. in Proceedings of SPIE, 2009, v. 7520, p. 1-11, article no. 75200E-
dc.identifier.scopusauthoridJia, N=34872289800en_HK
dc.identifier.scopusauthoridWong, AK=7403147663en_HK
dc.identifier.scopusauthoridLam, EY=7102890004en_HK

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