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Conference Paper: Alternating phase-shifting mask design for low aberration sensitivity
Title | Alternating phase-shifting mask design for low aberration sensitivity |
---|---|
Authors | |
Keywords | Aberration Alternating phase-shifting mask Image placement error Monte carlo analysis Phase width Zernike coefficient |
Issue Date | 2004 |
Publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml |
Citation | Proceedings Of Spie - The International Society For Optical Engineering, 2004, v. 5377 PART 1, p. 591-601 How to Cite? |
Abstract | Theories are developed to optimize the mask structure of alternating phase-shifting masks (PSMs) to minimize the average image placement error towards aberration under coherent imaging. The constraint of the optimization is a given mean value of RMS aberration, which corresponds to infinitely many sets of random Zernike coefficients. To begin the analysis, the image placement error is expressed as a function of the mask spectrum and the wave aberration. Monte Carlo analysis on the Zernike coefficients is then performed, which assures us that a global minimum of average image placement error is likely to occur at low phase widths. This result is confirmed by analytically considering the expected value of the square of the image placement error. By Golden Section Search, the optimal phase width is found to be 0.3707(λ/NA) at 0.07λ RMS aberration. This methodology of finding the optimal phase width is applicable to the design of all alternating PSMs. |
Persistent Identifier | http://hdl.handle.net/10722/44718 |
ISSN | 2023 SCImago Journal Rankings: 0.152 |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Mak, GY | en_HK |
dc.contributor.author | Wong, AK | en_HK |
dc.contributor.author | Lam, EY | en_HK |
dc.date.accessioned | 2007-10-30T06:08:38Z | - |
dc.date.available | 2007-10-30T06:08:38Z | - |
dc.date.issued | 2004 | en_HK |
dc.identifier.citation | Proceedings Of Spie - The International Society For Optical Engineering, 2004, v. 5377 PART 1, p. 591-601 | en_HK |
dc.identifier.issn | 0277-786X | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/44718 | - |
dc.description.abstract | Theories are developed to optimize the mask structure of alternating phase-shifting masks (PSMs) to minimize the average image placement error towards aberration under coherent imaging. The constraint of the optimization is a given mean value of RMS aberration, which corresponds to infinitely many sets of random Zernike coefficients. To begin the analysis, the image placement error is expressed as a function of the mask spectrum and the wave aberration. Monte Carlo analysis on the Zernike coefficients is then performed, which assures us that a global minimum of average image placement error is likely to occur at low phase widths. This result is confirmed by analytically considering the expected value of the square of the image placement error. By Golden Section Search, the optimal phase width is found to be 0.3707(λ/NA) at 0.07λ RMS aberration. This methodology of finding the optimal phase width is applicable to the design of all alternating PSMs. | en_HK |
dc.format.extent | 245456 bytes | - |
dc.format.extent | 41662 bytes | - |
dc.format.extent | 4084 bytes | - |
dc.format.mimetype | application/pdf | - |
dc.format.mimetype | image/tiff | - |
dc.format.mimetype | text/plain | - |
dc.language | eng | en_HK |
dc.publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml | en_HK |
dc.relation.ispartof | Proceedings of SPIE - The International Society for Optical Engineering | en_HK |
dc.rights | Copyright 2004 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/12.534686 | - |
dc.subject | Aberration | en_HK |
dc.subject | Alternating phase-shifting mask | en_HK |
dc.subject | Image placement error | en_HK |
dc.subject | Monte carlo analysis | en_HK |
dc.subject | Phase width | en_HK |
dc.subject | Zernike coefficient | en_HK |
dc.title | Alternating phase-shifting mask design for low aberration sensitivity | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1537-1646&volume=4&issue=1&spage=013008&epage=&date=2005&atitle=Alternating+phase-shifting+mask+design+for+low+aberration+sensitivity | en_HK |
dc.identifier.email | Lam, EY:elam@eee.hku.hk | en_HK |
dc.identifier.authority | Lam, EY=rp00131 | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1117/12.534686 | en_HK |
dc.identifier.scopus | eid_2-s2.0-3843104604 | en_HK |
dc.identifier.hkuros | 101034 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-3843104604&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 5377 | en_HK |
dc.identifier.issue | PART 1 | en_HK |
dc.identifier.spage | 591 | en_HK |
dc.identifier.epage | 601 | en_HK |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Mak, GY=8678365200 | en_HK |
dc.identifier.scopusauthorid | Wong, AK=7403147663 | en_HK |
dc.identifier.scopusauthorid | Lam, EY=7102890004 | en_HK |
dc.identifier.issnl | 0277-786X | - |