File Download
  Links for fulltext
     (May Require Subscription)
Supplementary

Article: Microlithography: trends, challenges, solutions, and their impact on design

TitleMicrolithography: trends, challenges, solutions, and their impact on design
Authors
KeywordsComputers
MICROCOMPUTERS COMPUTERS
PERSONAL COMPUTERS
Issue Date2003
PublisherIEEE. The Journal's web site is located at http://www.computer.org/micro
Citation
IEEE Micro, 2003, v. 23 n. 2, p. 12-21 How to Cite?
AbstractWith lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30 nm physical-gate-length era with optical lithography. Optical lithography is an enabling technology for transistor miniaturization. With the wavelength and numerical aperture of exposure systems approaching their limits, the semiconductor industry needs continuous reduction of the k/sub 1/ factor. Challenges include image quality improvement, proximity effect correction, and cost control. An indispensable ingredient for future success is improvement in the design-manufacture interface.
Persistent Identifierhttp://hdl.handle.net/10722/44747
ISSN
2015 Impact Factor: 1.091
2015 SCImago Journal Rankings: 0.686
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorWong, AKen_HK
dc.date.accessioned2007-10-30T06:09:18Z-
dc.date.available2007-10-30T06:09:18Z-
dc.date.issued2003en_HK
dc.identifier.citationIEEE Micro, 2003, v. 23 n. 2, p. 12-21en_HK
dc.identifier.issn0272-1732en_HK
dc.identifier.urihttp://hdl.handle.net/10722/44747-
dc.description.abstractWith lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30 nm physical-gate-length era with optical lithography. Optical lithography is an enabling technology for transistor miniaturization. With the wavelength and numerical aperture of exposure systems approaching their limits, the semiconductor industry needs continuous reduction of the k/sub 1/ factor. Challenges include image quality improvement, proximity effect correction, and cost control. An indispensable ingredient for future success is improvement in the design-manufacture interface.en_HK
dc.format.extent444928 bytes-
dc.format.extent5278 bytes-
dc.format.mimetypeapplication/pdf-
dc.format.mimetypetext/plain-
dc.languageengen_HK
dc.publisherIEEE. The Journal's web site is located at http://www.computer.org/microen_HK
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rights©2003 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.en_HK
dc.subjectComputersen_HK
dc.subjectMICROCOMPUTERS COMPUTERSen_HK
dc.subjectPERSONAL COMPUTERSen_HK
dc.titleMicrolithography: trends, challenges, solutions, and their impact on designen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0272-1732&volume=23&issue=2&spage=12&epage=21&date=2003&atitle=Microlithography:+trends,+challenges,+solutions,+and+their+impact+on+designen_HK
dc.description.naturepublished_or_final_versionen_HK
dc.identifier.doi10.1109/MM.2003.1196111en_HK
dc.identifier.scopuseid_2-s2.0-0038294739-
dc.identifier.isiWOS:000182429200006-

Export via OAI-PMH Interface in XML Formats


OR


Export to Other Non-XML Formats