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Article: Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography

TitleInitialization for robust inverse synthesis of phase-shifting masks in optical projection lithography
Authors
Issue Date2008
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2008, v. 16 n. 19, p. 14746-14760 How to Cite?
AbstractThe continuous shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical projection lithography process, generating circuit patterns that deviate significantly from the desired ones. Conventional resolution enhancement techniques (RETs) are facing critical challenges in compensating such increasingly severe distortion. In this paper, we adopt the approach of inverse lithography in the mask design, which is a branch of design methodology to treat it as an inverse mathematical problem. We focus on using pixel-based algorithms to design alternating phase-shifting masks with minimally distorted output, with the goal that the patterns generated should have high contrast and low dose sensitivity. This is achieved with a dynamic-programming-based initialization scheme to pre-assign phases to the layout when alternating phase-shifting masks are used. Pattern fidelity and worst case slopes are shown to improve with this initialization scheme, which are important for robustness considerations. © 2008 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/58715
ISSN
2015 Impact Factor: 3.148
2015 SCImago Journal Rankings: 2.186
ISI Accession Number ID
Funding AgencyGrant Number
Research Grants Council of the Hong Kong Special Administrative Region, ChinaHKU 7139/06E
Funding Information:

This work was supported in part by the Research Grants Council of the Hong Kong Special Administrative Region, China under Project HKU 7139/06E.

References
Grants

 

DC FieldValueLanguage
dc.contributor.authorChan, SHen_HK
dc.contributor.authorWong, AKen_HK
dc.contributor.authorLam, EYen_HK
dc.date.accessioned2010-05-31T03:35:37Z-
dc.date.available2010-05-31T03:35:37Z-
dc.date.issued2008en_HK
dc.identifier.citationOptics Express, 2008, v. 16 n. 19, p. 14746-14760en_HK
dc.identifier.issn1094-4087en_HK
dc.identifier.urihttp://hdl.handle.net/10722/58715-
dc.description.abstractThe continuous shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical projection lithography process, generating circuit patterns that deviate significantly from the desired ones. Conventional resolution enhancement techniques (RETs) are facing critical challenges in compensating such increasingly severe distortion. In this paper, we adopt the approach of inverse lithography in the mask design, which is a branch of design methodology to treat it as an inverse mathematical problem. We focus on using pixel-based algorithms to design alternating phase-shifting masks with minimally distorted output, with the goal that the patterns generated should have high contrast and low dose sensitivity. This is achieved with a dynamic-programming-based initialization scheme to pre-assign phases to the layout when alternating phase-shifting masks are used. Pattern fidelity and worst case slopes are shown to improve with this initialization scheme, which are important for robustness considerations. © 2008 Optical Society of America.en_HK
dc.languageengen_HK
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.orgen_HK
dc.relation.ispartofOptics Expressen_HK
dc.rightsOptics Express. Copyright © Optical Society of America.en_HK
dc.subject.meshAlgorithmsen_HK
dc.subject.meshImage Interpretation, Computer-Assisted - methodsen_HK
dc.subject.meshLasersen_HK
dc.subject.meshLighting - methodsen_HK
dc.subject.meshPhotography - methodsen_HK
dc.titleInitialization for robust inverse synthesis of phase-shifting masks in optical projection lithographyen_HK
dc.typeArticleen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1094-4087&volume=16&spage=14746–14760&epage=&date=2008&atitle=Initialization+for+robust+inverse+synthesis+of+phase-shifting+masks+in+optical+projection+lithographyen_HK
dc.identifier.emailLam, EY:elam@eee.hku.hken_HK
dc.identifier.authorityLam, EY=rp00131en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1364/OE.16.014746en_HK
dc.identifier.pmid18795012en_HK
dc.identifier.scopuseid_2-s2.0-51849161519en_HK
dc.identifier.hkuros158723en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-51849161519&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume16en_HK
dc.identifier.issue19en_HK
dc.identifier.spage14746en_HK
dc.identifier.epage14760en_HK
dc.identifier.eissn1094-4087-
dc.identifier.isiWOS:000259271900047-
dc.publisher.placeUnited Statesen_HK
dc.relation.projectImaging system modeling and image synthesis for resolution enhancement in optical lithography-
dc.identifier.scopusauthoridChan, SH=24824181300en_HK
dc.identifier.scopusauthoridWong, AK=7403147663en_HK
dc.identifier.scopusauthoridLam, EY=7102890004en_HK

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