Showing results 12 to 17 of 17
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| Title | Author(s) | Issue Date | |
|---|---|---|---|
Regularization of inverse photomask synthesis to enhance manufacturability Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2009 | ||
A robust computational algorithm for inverse photomask synthesis in optical projection lithography Journal:SIAM Journal on Imaging Sciences | 2012 | ||
Robust level-set-based inverse lithography Journal:Optics Express | 2011 | ||
Robust mask design with defocus variation using inverse synthesis Proceeding/Conference:Proceedings of SPIE | 2008 | ||
Robustness enhancement in optical lithography: From pixelated mask optimization to pixelated source-mask optimization Proceeding/Conference:ECS Transactions | 2011 | ||
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography Proceeding/Conference:Proceedings - International Conference on Image Processing, ICIP | 2010 |