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Article: A robust computational algorithm for inverse photomask synthesis in optical projection lithography

TitleA robust computational algorithm for inverse photomask synthesis in optical projection lithography
Authors
KeywordsImage synthesis
Total variation
Inverse lithography
Issue Date2012
PublisherSociety for Industrial and Applied Mathematics. The Journal's web site is located at http://www.siam.org/journals/siims.php
Citation
SIAM Journal on Imaging Sciences, 2012, v. 5 n. 2, p. 625–651 How to Cite?
AbstractInverse lithography technology formulates the photomask synthesis as an inverse mathematical problem. To solve this, we propose a variational functional and develop a robust computational algorithm, where the proposed functional takes into account the process variations and incorporates several regularization terms that can control the mask complexity. We establish the existence of the minimizer of the functional, and in order to optimize it effectively, we adopt an alternating minimization procedure with Chambolle's fast duality projection algorithm. Experimental results show that our proposed algorithm is effective in synthesizing high quality photomasks as compared with existing methods.
Persistent Identifierhttp://hdl.handle.net/10722/152663
ISI Accession Number ID
Funding AgencyGrant Number
University Research Committee of the University of Hong Kong10400898
Research Grants Council of the Hong Kong Special Administrative Region, ChinaHKU 7134/08E
UGC Areas of Excellence project Theory, Modeling, and Simulation of Emerging Electronics
RGC GRFHKBU202108
HKBU261007
HKBU261508
Funding Information:

The research of these authors was supported in part by the University Research Committee of the University of Hong Kong under project 10400898, by the Research Grants Council of the Hong Kong Special Administrative Region, China, under projects HKU 7134/08E, and by the UGC Areas of Excellence project Theory, Modeling, and Simulation of Emerging Electronics.

 

DC FieldValueLanguage
dc.contributor.authorChoy, SKen_US
dc.contributor.authorJia, Nen_US
dc.contributor.authorTong, CSen_US
dc.contributor.authorTang, MLen_US
dc.contributor.authorLam, EYMen_US
dc.date.accessioned2012-07-16T09:45:52Z-
dc.date.available2012-07-16T09:45:52Z-
dc.date.issued2012en_US
dc.identifier.citationSIAM Journal on Imaging Sciences, 2012, v. 5 n. 2, p. 625–651en_US
dc.identifier.urihttp://hdl.handle.net/10722/152663-
dc.description.abstractInverse lithography technology formulates the photomask synthesis as an inverse mathematical problem. To solve this, we propose a variational functional and develop a robust computational algorithm, where the proposed functional takes into account the process variations and incorporates several regularization terms that can control the mask complexity. We establish the existence of the minimizer of the functional, and in order to optimize it effectively, we adopt an alternating minimization procedure with Chambolle's fast duality projection algorithm. Experimental results show that our proposed algorithm is effective in synthesizing high quality photomasks as compared with existing methods.-
dc.languageengen_US
dc.publisherSociety for Industrial and Applied Mathematics. The Journal's web site is located at http://www.siam.org/journals/siims.php-
dc.relation.ispartofSIAM Journal on Imaging Sciencesen_US
dc.rightsSIAM Journal on Imaging Sciences. Copyright © Society for Industrial and Applied Mathematics-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectImage synthesis-
dc.subjectTotal variation-
dc.subjectInverse lithography-
dc.titleA robust computational algorithm for inverse photomask synthesis in optical projection lithographyen_US
dc.typeArticleen_US
dc.identifier.emailLam, EYM: elam@eee.hku.hken_US
dc.identifier.authorityLam, EYM=rp00131en_US
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1137/110830356-
dc.identifier.scopuseid_2-s2.0-84863737750-
dc.identifier.hkuros200969en_US
dc.identifier.volume5en_US
dc.identifier.eissn1936-4954-
dc.identifier.isiWOS:000306100200006-
dc.publisher.placeUnited States-

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