Showing results 1 to 4 of 4
Title | Author(s) | Issue Date | |
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2016 | |||
2015 | |||
Nitrided HfTiON/Ga2O3 (Gd2O3) as stacked gate dielectric for GaAs MOS applications Journal:Applied Physics Express | 2014 | ||
Plasma-nitrided Ga2O3(Gd2O3) as interfacial passivation layer for InGaAs metal-oxide-semiconductor capacitor with HfTiON gate dielectric Journal:IEEE Transactions on Electron Devices | 2015 |