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  Patent History
  • Application
    US 11/331264 2006-01-11
  • Publication
    US 2006157159 2006-07-20
Supplementary

published patent: Surface treated shape memory materials and methods for making same

TitleSurface treated shape memory materials and methods for making same
Priority Date2006-01-11 US 11/331264
2005-01-13 US 11/643744P
Inventors
Issue Date2006
Citation
US Published patent application US 2006157159. Washington, DC: US Patent and Trademark Office (USPTO), 2006 How to Cite?
AbstractThe invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.
Persistent Identifierhttp://hdl.handle.net/10722/176921

 

DC FieldValueLanguage
dc.date.accessioned2012-11-30T08:38:45Z-
dc.date.available2012-11-30T08:38:45Z-
dc.date.issued2006-
dc.identifier.citationUS Published patent application US 2006157159. Washington, DC: US Patent and Trademark Office (USPTO), 2006en_HK
dc.identifier.urihttp://hdl.handle.net/10722/176921-
dc.description.abstractThe invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.en_HK
dc.relation.isreferencedbyUS 2009175918 (A1) 2009-07-09en_HK
dc.relation.isreferencedbyUS 8153015 (B2) 2012-04-10en_HK
dc.relation.isreferencedbyWO 2008156666 (A3) 2009-02-12en_HK
dc.relation.isreferencedbyWO 2008156666 (A2) 2008-12-24en_HK
dc.titleSurface treated shape memory materials and methods for making sameen_HK
dc.typePatenten_US
dc.description.naturepublished_or_final_versionen_US
dc.identifier.hkuros121533-
dc.identifier.hkuros105971-
dc.contributor.inventorYeung, KWKen_HK
dc.contributor.inventorPoon Ray Wen_HK
dc.contributor.inventorChu Paul Ken_HK
dc.contributor.inventorCheung, KMCen_HK
dc.contributor.inventorLu, WWen_HK
patents.identifier.applicationUS 11/331264en_HK
patents.description.assigneeVERSITECH LIMITED, ; THE CITY UNIVERSITY OF HONG KONGen_HK
patents.description.countryUnited States of Americaen_HK
patents.date.publication2006-07-20en_HK
patents.date.application2006-01-11en_HK
patents.date.priority2006-01-11 US 11/331264en_HK
patents.date.priority2005-01-13 US 11/643744Pen_HK
patents.description.ccUSen_HK
patents.identifier.publicationUS 2006157159en_HK
patents.relation.familyAT 485845 (T) 2010-11-15en_HK
patents.relation.familyCN 101128224 (A) 2008-02-20en_HK
patents.relation.familyEP 1835946 (A1) 2007-09-26en_HK
patents.relation.familyES 2356465 (T3) 2011-04-08en_HK
patents.relation.familyUS 2006157159 (A1) 2006-07-20en_HK
patents.relation.familyUS 7803234 (B2) 2010-09-28en_HK
patents.relation.familyWO 2006074604 (A1) 2006-07-20en_HK
patents.description.kindA1en_HK
patents.typePatent_publisheden_HK

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