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  Patent History
  • Application
    CN 20068002225 2006-01-11
  • Publication
    CN 101128224 2008-02-20
  Patent Family
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published patent: Surface treated shape memory materials and methods for making same

TitleSurface treated shape memory materials and methods for making same
Priority Date2005-01-13 US 11/643744P
Inventors
Lu, WWCheung, KMCChu, CHYeung, KWKPoon, WY
Issue Date2008
Citation
China Published Patent Application CN 101128224. Beijing, PRC: State Intellectual Property Office (SIPO) of the P.R.C., 2008 How to Cite?
AbstractThe invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.
Persistent Identifierhttp://hdl.handle.net/10722/176609

 

DC FieldValueLanguage
dc.date.accessioned2012-11-30T08:38:13Z-
dc.date.available2012-11-30T08:38:13Z-
dc.date.issued2008-
dc.identifier.citationChina Published Patent Application CN 101128224. Beijing, PRC: State Intellectual Property Office (SIPO) of the P.R.C., 2008en_HK
dc.identifier.urihttp://hdl.handle.net/10722/176609-
dc.description.abstractThe invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.en_HK
dc.relation.isreferencedbyWO 2010094212 (A3) 2011-01-06en_HK
dc.relation.isreferencedbyWO 2010094212 (A2) 2010-08-26en_HK
dc.titleSurface treated shape memory materials and methods for making sameen_HK
dc.typePatenten_US
dc.description.naturepublished_or_final_versionen_US
dc.contributor.inventorLu, WW-
dc.contributor.inventorCheung, KMC-
dc.contributor.inventorChu, CH-
dc.contributor.inventorYeung, KWK-
dc.contributor.inventorPoon, WY-
patents.identifier.applicationCN 20068002225en_HK
patents.description.assigneeVERSITECH LTD [HK]en_HK
patents.description.countryChina, PRCen_HK
patents.date.publication2008-02-20en_HK
patents.date.application2006-01-11en_HK
patents.date.priority2005-01-13 US 11/643744Pen_HK
patents.description.ccCNen_HK
patents.identifier.publicationCN 101128224en_HK
patents.relation.familyAT 485845 (T) 2010-11-15en_HK
patents.relation.familyCN 101128224 (A) 2008-02-20en_HK
patents.relation.familyEP 1835946 (A1) 2007-09-26en_HK
patents.relation.familyES 2356465 (T3) 2011-04-08en_HK
patents.relation.familyUS 2006157159 (A1) 2006-07-20en_HK
patents.relation.familyUS 7803234 (B2) 2010-09-28en_HK
patents.relation.familyWO 2006074604 (A1) 2006-07-20en_HK
patents.description.kindAen_HK
patents.typePatent_publisheden_HK

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