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- Publisher Website: 10.1109/ICIP.2008.4712134
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Conference Paper: Inverse image problem of designing phase shifting masks in optical lithography
Title | Inverse image problem of designing phase shifting masks in optical lithography |
---|---|
Authors | |
Keywords | Inverse problems Optical lithography Optical proximity correction Resolution enhancement techniques |
Issue Date | 2008 |
Publisher | I E E E. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/conhome.jsp?punumber=1000349 |
Citation | Proceedings - International Conference On Image Processing, Icip, 2008, p. 1832-1835 How to Cite? |
Abstract | The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical lithography process, generating circuit patterns deviating from the desired ones. Conventional resolution enhancement techniques (RETs) are facing critical challenges in compensating such increasingly severe distortion. The approach of inverse lithography, which is a branch of mask design methodology to treat the design as an inverse image problem, is adopted in this paper. We apply nonlinear optimization techniques to design masks with minimally distorted output. The output patterns so generated have high contrast and low dose sensitivity. We also propose a dynamic program-based initialization scheme to pre-assign phases to the layout. © 2008 IEEE. |
Description | IEEE International Conference on Image Processing |
Persistent Identifier | http://hdl.handle.net/10722/61975 |
ISSN | 2020 SCImago Journal Rankings: 0.315 |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chan, SH | en_HK |
dc.contributor.author | Lam, EY | en_HK |
dc.date.accessioned | 2010-07-13T03:51:20Z | - |
dc.date.available | 2010-07-13T03:51:20Z | - |
dc.date.issued | 2008 | en_HK |
dc.identifier.citation | Proceedings - International Conference On Image Processing, Icip, 2008, p. 1832-1835 | en_HK |
dc.identifier.issn | 1522-4880 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/61975 | - |
dc.description | IEEE International Conference on Image Processing | en_HK |
dc.description.abstract | The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical lithography process, generating circuit patterns deviating from the desired ones. Conventional resolution enhancement techniques (RETs) are facing critical challenges in compensating such increasingly severe distortion. The approach of inverse lithography, which is a branch of mask design methodology to treat the design as an inverse image problem, is adopted in this paper. We apply nonlinear optimization techniques to design masks with minimally distorted output. The output patterns so generated have high contrast and low dose sensitivity. We also propose a dynamic program-based initialization scheme to pre-assign phases to the layout. © 2008 IEEE. | en_HK |
dc.language | eng | en_HK |
dc.publisher | I E E E. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/conhome.jsp?punumber=1000349 | en_HK |
dc.relation.ispartof | Proceedings - International Conference on Image Processing, ICIP | en_HK |
dc.subject | Inverse problems | en_HK |
dc.subject | Optical lithography | en_HK |
dc.subject | Optical proximity correction | en_HK |
dc.subject | Resolution enhancement techniques | en_HK |
dc.title | Inverse image problem of designing phase shifting masks in optical lithography | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.email | Lam, EY:elam@eee.hku.hk | en_HK |
dc.identifier.authority | Lam, EY=rp00131 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1109/ICIP.2008.4712134 | en_HK |
dc.identifier.scopus | eid_2-s2.0-69949131722 | en_HK |
dc.identifier.hkuros | 158732 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-69949131722&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.spage | 1832 | en_HK |
dc.identifier.epage | 1835 | en_HK |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Chan, SH=24824181300 | en_HK |
dc.identifier.scopusauthorid | Lam, EY=7102890004 | en_HK |
dc.identifier.issnl | 1522-4880 | - |