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Conference Paper: Optimum mask and source patterns to print a given shape
Title | Optimum mask and source patterns to print a given shape |
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Authors | |
Keywords | Off-axis illumination source optimization RET OPC global optimization |
Issue Date | 2001 |
Publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings |
Citation | S P I E Conference on Optical microlithography XIV, Santa Clara, USA, 27 February - 2 March 2001. In Proceedings of SPIE, 2001, v. 4346, p. 486-502 How to Cite? |
Abstract | New degrees of freedom can be optimized in mask shapes when the source is also adjustable, because required image symmetries can be provided by the source rather than the collected wavefront. The optimized mask will often consist of novel sets of shapes that are quite different in layout from the target IC patterns. This implies that the optimization algorithm should have good global convergence properties, since the target patterns may not be a suitable starting solution. We have eveloped an algorithm that can optimize mask and source without using a starting design. Examples are shown where the process window obtained is between 2 and 6 times larger than that achieved with standard RET methods. The optimized masks require phase shift, but no trim mask is used. Thus far we have only optimized 2D patterns over small fields (periodicities of 1im or less). We also discuss mask optimization with fixed source, source optimization with fixed mask, and the re-targeting of designs in different mask regions to provide a common exposure level. |
Description | Proceedings of S P I E - the International Society for Optical |
Persistent Identifier | http://hdl.handle.net/10722/54040 |
ISSN | 2023 SCImago Journal Rankings: 0.152 |
DC Field | Value | Language |
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dc.contributor.author | Rosenbluth, AE | en_HK |
dc.contributor.author | Bukofsky, SJ | en_HK |
dc.contributor.author | Hibbs, MS | en_HK |
dc.contributor.author | Lai, K | en_HK |
dc.contributor.author | Molless, AF | en_HK |
dc.contributor.author | Singh, RN | en_HK |
dc.contributor.author | Wong, AKK | en_HK |
dc.date.accessioned | 2009-04-03T07:35:12Z | - |
dc.date.available | 2009-04-03T07:35:12Z | - |
dc.date.issued | 2001 | en_HK |
dc.identifier.citation | S P I E Conference on Optical microlithography XIV, Santa Clara, USA, 27 February - 2 March 2001. In Proceedings of SPIE, 2001, v. 4346, p. 486-502 | - |
dc.identifier.issn | 0277-786X | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/54040 | - |
dc.description | Proceedings of S P I E - the International Society for Optical | en_HK |
dc.description.abstract | New degrees of freedom can be optimized in mask shapes when the source is also adjustable, because required image symmetries can be provided by the source rather than the collected wavefront. The optimized mask will often consist of novel sets of shapes that are quite different in layout from the target IC patterns. This implies that the optimization algorithm should have good global convergence properties, since the target patterns may not be a suitable starting solution. We have eveloped an algorithm that can optimize mask and source without using a starting design. Examples are shown where the process window obtained is between 2 and 6 times larger than that achieved with standard RET methods. The optimized masks require phase shift, but no trim mask is used. Thus far we have only optimized 2D patterns over small fields (periodicities of 1im or less). We also discuss mask optimization with fixed source, source optimization with fixed mask, and the re-targeting of designs in different mask regions to provide a common exposure level. | en_HK |
dc.language | eng | en_HK |
dc.publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings | en_HK |
dc.relation.ispartof | Proceedings of SPIE | - |
dc.rights | Copyright 2001 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/12.435748 | - |
dc.subject | Off-axis illumination | en_HK |
dc.subject | source optimization | en_HK |
dc.subject | RET | en_HK |
dc.subject | OPC | en_HK |
dc.subject | global optimization | en_HK |
dc.title | Optimum mask and source patterns to print a given shape | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0277-786X&volume=4346&spage=486&epage=502&date=2001&atitle=Optimum+mask+and+source+patterns+to+print+a+given+shape | en_HK |
dc.identifier.email | Wong, AKK: awong@eee.hku.hk | en_HK |
dc.description.nature | published_or_final_version | en_HK |
dc.identifier.doi | 10.1117/12.435748 | en_HK |
dc.identifier.scopus | eid_2-s2.0-0035758402 | - |
dc.identifier.hkuros | 58694 | - |
dc.identifier.issnl | 0277-786X | - |