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Conference Paper: Aberration measurement using in-situ two-beam interferometry
| Title | Aberration measurement using in-situ two-beam interferometry |
|---|---|
| Authors | |
| Keywords | aberrations blazed gratings two beam interferometry lens stability surface relief images |
| Issue Date | 2001 |
| Publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings |
| Citation | Optical microlithography XIV, Santa Clara, USA, 27 February - 2 March 2001. In Proceedings of SPIE, 2001, v. 4346, p. 8-14 How to Cite? |
| Abstract | A reticle with phase-only blazed gratings ofvaiying azimuthal orientations diffracts light into only two orders, 0 & +1, discretely illuminating a lens pupil. The image ofeach grating is a sinusoidal interference pattern and is recorded as a surface relief in a highly absorbing photoresist. The maximum image contrast occurs when focus is set such that the RMS wavefront error over the two beams is minimized. This maximum contrast vs focus is recorded by a CCD array mounted on a dark-field optical microscope and the aberrations are obtained from an analysis of this record. Repeatability of equivalent primary aberrations ofless than O.OO17RMS are achieved and used to monitor lens stability. |
| Persistent Identifier | http://hdl.handle.net/10722/46227 |
| ISSN | 2023 SCImago Journal Rankings: 0.152 |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kirk, JP | en_HK |
| dc.contributor.author | Kunkel, G | en_HK |
| dc.contributor.author | Wong, AKK | en_HK |
| dc.date.accessioned | 2007-10-30T06:45:13Z | - |
| dc.date.available | 2007-10-30T06:45:13Z | - |
| dc.date.issued | 2001 | en_HK |
| dc.identifier.citation | Optical microlithography XIV, Santa Clara, USA, 27 February - 2 March 2001. In Proceedings of SPIE, 2001, v. 4346, p. 8-14 | - |
| dc.identifier.issn | 0277-786X | en_HK |
| dc.identifier.uri | http://hdl.handle.net/10722/46227 | - |
| dc.description.abstract | A reticle with phase-only blazed gratings ofvaiying azimuthal orientations diffracts light into only two orders, 0 & +1, discretely illuminating a lens pupil. The image ofeach grating is a sinusoidal interference pattern and is recorded as a surface relief in a highly absorbing photoresist. The maximum image contrast occurs when focus is set such that the RMS wavefront error over the two beams is minimized. This maximum contrast vs focus is recorded by a CCD array mounted on a dark-field optical microscope and the aberrations are obtained from an analysis of this record. Repeatability of equivalent primary aberrations ofless than O.OO17RMS are achieved and used to monitor lens stability. | en_HK |
| dc.format.extent | 317131 bytes | - |
| dc.format.extent | 5278 bytes | - |
| dc.format.mimetype | application/pdf | - |
| dc.format.mimetype | text/plain | - |
| dc.language | eng | en_HK |
| dc.publisher | S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings | en_HK |
| dc.relation.ispartof | Proceedings of SPIE | - |
| dc.rights | Copyright 2001 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/12.435717 | - |
| dc.subject | aberrations | en_HK |
| dc.subject | blazed gratings | en_HK |
| dc.subject | two beam interferometry | en_HK |
| dc.subject | lens stability | en_HK |
| dc.subject | surface relief images | en_HK |
| dc.title | Aberration measurement using in-situ two-beam interferometry | en_HK |
| dc.type | Conference_Paper | en_HK |
| dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0277-786X&volume=4346&spage=8&epage=14&date=2001&atitle=Aberration+measurement+using+in-situ+two-beam+interferometry | en_HK |
| dc.description.nature | published_or_final_version | en_HK |
| dc.identifier.doi | 10.1117/12.435717 | en_HK |
| dc.identifier.scopus | eid_2-s2.0-0035759407 | - |
| dc.identifier.hkuros | 58717 | - |
| dc.identifier.issnl | 0277-786X | - |