Showing results 1 to 6 of 6
Title | Author(s) | Issue Date | |
---|---|---|---|
Comprehensive investigation on CF4/O2-plasma treating the interfaces of stacked gate dielectric in MoS2 transistors Journal:Applied Surface Science | 2021 | ||
2018 | |||
Effects of trapped charges in gate dielectric and high- k encapsulation on performance of MoS2 transistor Journal:IEEE Transactions on Electron Devices | 2019 | ||
Improved interfacial and electrical properties of few-layered MoS2 FETs with plasma-treated Al2O3 as gate dielectric Journal:Applied Surface Science | 2019 | ||
Intelligent Modeling and Verification (Editorial) Journal:Journal of Applied Mathematics | 2013 | ||
Optimizing Al-doped ZrO2 as the gate dielectric for MoS2 field-effect transistors Journal:Nanotechnology | 2020 |