Skip navigation
HKU Login
Guest Login
Home
Publications
Researchers
Staff
Research Postgraduates
Organizations
Grants
Datasets
Deposit Data
HKUL Research Data Management
Theses
Patents
Community Service
Browsing "Department of Electrical & Electronic Engineering" by Author fleischer, s
Jump to:
0-9
A
B
C
D
E
F
G
H
I
J
K
L
M
N
O
P
Q
R
S
T
U
V
W
X
Y
Z
中
or enter first few letters:
Showing results 1 to 9 of 9
Title
Author(s)
Issue Date
Effects of nitridation and re-oxidation on drain leakage current in n-channel MOSFETs
Proceeding/Conference:
Conference on Solid State Devices and Materials
Fleischer, S
Liu, ZH
Lai, PT
Ma, ZJ
Cheng, YC
1990
Effects of nitridation temperature on the electron trap characteristics of nitrided-oxide metal-oxide-semiconductor capacitors
Journal:
Journal of Applied Physics
Fleischer, S
Lai, PT
Cheng, YC
1993
Impact of nitridation/reoxidation on performance degradation in n-MOSFETs under Fowler-Nordheim injection
Journal:
Solid-State Electronics
Ma, ZJ
Liu, ZH
Lai, PT
Fleischer, S
Cheng, YC
1992
A new method for extracting the trap energy in insulators
Journal:
Journal of Applied Physics
Fleischer, S
Lai, PT
Cheng, YC
1993
Off-state leakage currents in n-channel metal-oxide-semiconductor field-effect transistors with 10-nm thermally nitrided and reoxidized nitrided oxides as the gate dielectric
Journal:
Applied Physics Letters
Fleischer, S
Liu, ZH
Lai, PT
Ko, PK
Cheng, YC
1991
Simplified closed-form trap-assisted tunneling model applied to nitrided oxide dielectric capacitors
Journal:
Journal of Applied Physics
Fleischer, S
Lai, PT
Cheng, YC
1992
The influence of ion implantation on the off-state leakage characteristics of n-MOSFETs with ultrathin oxide, nitrided-oxide and re-oxidized nitrided-oxide gate dielectrics
Proceeding/Conference:
International Conference on VLSI and CAD Proceedings
Fleischer, S
Lai, PT
Cheng, YC
1993
Trap-assisted conduction in nitrided-oxide and re-oxidized nitrided-oxide n-channel metal-oxide-semiconductor field-effect transistors
Journal:
Journal of Applied Physics
Fleischer, S
Lai, PT
Cheng, YC
1993
Tunneling-injection-induced turnaround behavior of threshold voltage in thermally nitrided oxide n-channel metal-oxide-semiconductor field-effect transistors
Journal:
Journal of Applied Physics
Ma, ZJ
Lai, PT
Liu, ZH
Fleischer, S
Cheng, YC
1990