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Article: Plasmonic field guided patterning of ordered colloidal nanostructures

TitlePlasmonic field guided patterning of ordered colloidal nanostructures
Authors
Keywordspolarization stabilizing
plasmonic field guided patterning
ordered colloidal nanostructures
Issue Date2019
Citation
Nanophotonics, 2019, v. 8, n. 3, p. 505-512 How to Cite?
Abstract© 2019 Yuanjie Yang, Shuang Zhang et al., published by De Gruyter, Berlin/Boston. Nano-patterned colloidal plasmonic metasurfaces are capable of manipulation of light at the subwavelength scale. However, achieving controllable lithography-free nano-patterning for colloidal metasurfaces still remains a major challenge, limiting their full potential in building advanced plasmonic devices. Here, we demonstrate plasmonic field guided patterning (PFGP) of ordered colloidal metallic nano-patterns using orthogonal laser standing evanescent wave (LSEW) fields. We achieved colloidal silver nano-patterns with a large area of 30 mm 2 in <10 min by using orthogonal LSEW fields with a non-focused ultralow fluence irradiation of 0.25 W cm -2 . The underlying mechanism of the formation of the nano-patterns is the light-induced polarization of the nanoparticles (NPs), which leads to a dipole-dipole interaction for stabilizing the nano-pattern formation, as confirmed by polarization-dependent surface-enhanced Raman spectroscopy. This optical field-directed self-assembly of NPs opens an avenue for designing and fabricating reconfigurable colloidal nano-patterned metasurfaces in large areas.
Persistent Identifierhttp://hdl.handle.net/10722/295105
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHuang, Xiaoping-
dc.contributor.authorChen, Kai-
dc.contributor.authorQi, Mingxi-
dc.contributor.authorZhang, Peifeng-
dc.contributor.authorLi, Yu-
dc.contributor.authorWinnerl, Stephan-
dc.contributor.authorSchneider, Harald-
dc.contributor.authorYang, Yuanjie-
dc.contributor.authorZhang, Shuang-
dc.date.accessioned2021-01-05T04:59:04Z-
dc.date.available2021-01-05T04:59:04Z-
dc.date.issued2019-
dc.identifier.citationNanophotonics, 2019, v. 8, n. 3, p. 505-512-
dc.identifier.urihttp://hdl.handle.net/10722/295105-
dc.description.abstract© 2019 Yuanjie Yang, Shuang Zhang et al., published by De Gruyter, Berlin/Boston. Nano-patterned colloidal plasmonic metasurfaces are capable of manipulation of light at the subwavelength scale. However, achieving controllable lithography-free nano-patterning for colloidal metasurfaces still remains a major challenge, limiting their full potential in building advanced plasmonic devices. Here, we demonstrate plasmonic field guided patterning (PFGP) of ordered colloidal metallic nano-patterns using orthogonal laser standing evanescent wave (LSEW) fields. We achieved colloidal silver nano-patterns with a large area of 30 mm 2 in <10 min by using orthogonal LSEW fields with a non-focused ultralow fluence irradiation of 0.25 W cm -2 . The underlying mechanism of the formation of the nano-patterns is the light-induced polarization of the nanoparticles (NPs), which leads to a dipole-dipole interaction for stabilizing the nano-pattern formation, as confirmed by polarization-dependent surface-enhanced Raman spectroscopy. This optical field-directed self-assembly of NPs opens an avenue for designing and fabricating reconfigurable colloidal nano-patterned metasurfaces in large areas.-
dc.languageeng-
dc.relation.ispartofNanophotonics-
dc.rightsThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.-
dc.subjectpolarization stabilizing-
dc.subjectplasmonic field guided patterning-
dc.subjectordered colloidal nanostructures-
dc.titlePlasmonic field guided patterning of ordered colloidal nanostructures-
dc.typeArticle-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1515/nanoph-2018-0211-
dc.identifier.scopuseid_2-s2.0-85062209815-
dc.identifier.volume8-
dc.identifier.issue3-
dc.identifier.spage505-
dc.identifier.epage512-
dc.identifier.eissn2192-8614-
dc.identifier.isiWOS:000461826700014-
dc.identifier.issnl2192-8614-

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