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- Publisher Website: 10.1109/NEMS.2012.6196850
- Scopus: eid_2-s2.0-84861551641
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Conference Paper: Fabrication and analysis of integrated MEMS pyramidal horn antenna for terahertz applications
| Title | Fabrication and analysis of integrated MEMS pyramidal horn antenna for terahertz applications |
|---|---|
| Authors | |
| Keywords | Horn Antenna KOH etching MEMS THz |
| Issue Date | 2012 |
| Citation | 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, 2012, p. 611-614 How to Cite? |
| Abstract | This paper reports the fabrication and analysis of a back-to-back pyramidal horn antenna based on Micro-electromechanical Systems (MEMS) technology, which is used in terahertz (THz) applications. This method is able to manufacture antenna with various geometrical configuration embedded in Si substrates. The dimensional tolerance of this technique is determined by the lithography process, which could be controlled down to tens nm. Therefore, this technique is controllable and of high precision and quality. The performance of fabricated antenna device was verified by Ansoft High Frequency Structure Simulator (HFSS) simulation. The result shows that the antenna gain ranges from 10-15dB, and voltage standing wave ratio (VSWR) is less than 2 in the frequency band of 3.25-3.55THz. © 2012 IEEE. |
| Persistent Identifier | http://hdl.handle.net/10722/286866 |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Li, C. | - |
| dc.contributor.author | Guo, L. | - |
| dc.contributor.author | Wu, W. G. | - |
| dc.contributor.author | Tang, X. S. | - |
| dc.contributor.author | Huang, F. Y. | - |
| dc.date.accessioned | 2020-09-07T11:45:53Z | - |
| dc.date.available | 2020-09-07T11:45:53Z | - |
| dc.date.issued | 2012 | - |
| dc.identifier.citation | 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012, 2012, p. 611-614 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/286866 | - |
| dc.description.abstract | This paper reports the fabrication and analysis of a back-to-back pyramidal horn antenna based on Micro-electromechanical Systems (MEMS) technology, which is used in terahertz (THz) applications. This method is able to manufacture antenna with various geometrical configuration embedded in Si substrates. The dimensional tolerance of this technique is determined by the lithography process, which could be controlled down to tens nm. Therefore, this technique is controllable and of high precision and quality. The performance of fabricated antenna device was verified by Ansoft High Frequency Structure Simulator (HFSS) simulation. The result shows that the antenna gain ranges from 10-15dB, and voltage standing wave ratio (VSWR) is less than 2 in the frequency band of 3.25-3.55THz. © 2012 IEEE. | - |
| dc.language | eng | - |
| dc.relation.ispartof | 2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 | - |
| dc.subject | Horn Antenna | - |
| dc.subject | KOH etching | - |
| dc.subject | MEMS | - |
| dc.subject | THz | - |
| dc.title | Fabrication and analysis of integrated MEMS pyramidal horn antenna for terahertz applications | - |
| dc.type | Conference_Paper | - |
| dc.description.nature | link_to_subscribed_fulltext | - |
| dc.identifier.doi | 10.1109/NEMS.2012.6196850 | - |
| dc.identifier.scopus | eid_2-s2.0-84861551641 | - |
| dc.identifier.spage | 611 | - |
| dc.identifier.epage | 614 | - |