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Conference Paper: Computational techniques to incorporate shot count reduction into inverse lithography

TitleComputational techniques to incorporate shot count reduction into inverse lithography
Authors
Wu, XLam, EYMLiu, S
Issue Date2015
Citation
The China Semiconductor Technology International Conference (CSTIC 2015) in conjunction with SEMICON China 2015, Shanghai, China, 15-16 March 2015. How to Cite?
DescriptionSymposium II: Lithography and Patterning - SEMICON China
Persistent Identifierhttp://hdl.handle.net/10722/211415

 

DC FieldValueLanguage
dc.contributor.authorWu, X-
dc.contributor.authorLam, EYM-
dc.contributor.authorLiu, S-
dc.date.accessioned2015-07-13T02:22:11Z-
dc.date.available2015-07-13T02:22:11Z-
dc.date.issued2015-
dc.identifier.citationThe China Semiconductor Technology International Conference (CSTIC 2015) in conjunction with SEMICON China 2015, Shanghai, China, 15-16 March 2015.-
dc.identifier.urihttp://hdl.handle.net/10722/211415-
dc.descriptionSymposium II: Lithography and Patterning - SEMICON China-
dc.languageeng-
dc.relation.ispartofChina Semiconductor Technology International Conference, CSTIC 2015-
dc.relation.ispartof中国国际半导体技术大会(CSTIC) 2015-
dc.titleComputational techniques to incorporate shot count reduction into inverse lithography-
dc.typeConference_Paper-
dc.identifier.emailLam, EYM: elam@eee.hku.hk-
dc.identifier.authorityLam, EYM=rp00131-
dc.identifier.hkuros245310-

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