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- Publisher Website: 10.1149/05201.0163ecst
- Scopus: eid_2-s2.0-84875912919
- WOS: WOS:000338945700024
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Conference Paper: Efficient mask synthesis with augmented Lagrangian methods in computational lithography
Title | Efficient mask synthesis with augmented Lagrangian methods in computational lithography |
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Authors | |
Keywords | Augmented Lagrangian methods Computational lithographies Equality constraints Inverse lithography technologies Objective functions |
Issue Date | 2013 |
Publisher | Electrochemical Society, Inc.. The Journal's web site is located at http://www.ecsdl.org/ECST/ |
Citation | The 2013 China Semiconductor Technology International Conference (CSTIC 2013), Shanghai, China, 19-21 March 2013. In ECS Transactions, 2013, v. 52 n. 1, p. 163-168 How to Cite? |
Abstract | A fast approach based on augmented Lagrangian methods (ALMs) is proposed to solve the inverse imaging problem in optical lithography, known as inverse lithography technology. We develop a constrained optimization framework where the objective function includes a data-fidelity term and a binary equality constraint. We show how optimal solutions are reached with less execution time by applying the quasi-Newton method to the sub-problem. The proposed scheme also includes a tentative penalty parameter schedule for adjustment and control. Simulation results are compared with existing source-mask optimization (SMO) to illustrate the performance improvement in terms of pattern fidelity, convergence rate and process window size. Copyright © 2013 by ECS - The Electrochemical Society. |
Persistent Identifier | http://hdl.handle.net/10722/186794 |
ISSN | 2020 SCImago Journal Rankings: 0.235 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Li, J | en_US |
dc.contributor.author | Lam, EY | en_US |
dc.date.accessioned | 2013-08-20T12:19:31Z | - |
dc.date.available | 2013-08-20T12:19:31Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.citation | The 2013 China Semiconductor Technology International Conference (CSTIC 2013), Shanghai, China, 19-21 March 2013. In ECS Transactions, 2013, v. 52 n. 1, p. 163-168 | en_US |
dc.identifier.issn | 1938-6737 | - |
dc.identifier.uri | http://hdl.handle.net/10722/186794 | - |
dc.description.abstract | A fast approach based on augmented Lagrangian methods (ALMs) is proposed to solve the inverse imaging problem in optical lithography, known as inverse lithography technology. We develop a constrained optimization framework where the objective function includes a data-fidelity term and a binary equality constraint. We show how optimal solutions are reached with less execution time by applying the quasi-Newton method to the sub-problem. The proposed scheme also includes a tentative penalty parameter schedule for adjustment and control. Simulation results are compared with existing source-mask optimization (SMO) to illustrate the performance improvement in terms of pattern fidelity, convergence rate and process window size. Copyright © 2013 by ECS - The Electrochemical Society. | - |
dc.language | eng | en_US |
dc.publisher | Electrochemical Society, Inc.. The Journal's web site is located at http://www.ecsdl.org/ECST/ | - |
dc.relation.ispartof | ECS Transactions | en_US |
dc.rights | ECS Transactions. Copyright © Electrochemical Society, Inc.. | - |
dc.subject | Augmented Lagrangian methods | - |
dc.subject | Computational lithographies | - |
dc.subject | Equality constraints | - |
dc.subject | Inverse lithography technologies | - |
dc.subject | Objective functions | - |
dc.title | Efficient mask synthesis with augmented Lagrangian methods in computational lithography | en_US |
dc.type | Conference_Paper | en_US |
dc.identifier.email | Lam, EY: elam@eee.hku.hk | en_US |
dc.identifier.authority | Lam, EY=rp00131 | en_US |
dc.identifier.doi | 10.1149/05201.0163ecst | - |
dc.identifier.scopus | eid_2-s2.0-84875912919 | - |
dc.identifier.hkuros | 220500 | en_US |
dc.identifier.volume | 52 | - |
dc.identifier.issue | 1 | - |
dc.identifier.spage | 163 | - |
dc.identifier.epage | 168 | - |
dc.identifier.isi | WOS:000338945700024 | - |
dc.publisher.place | United States | - |
dc.customcontrol.immutable | sml 130903 | - |
dc.identifier.issnl | 1938-5862 | - |