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Conference Paper: Effect of ion-beam bombardment on exchange bias of NiO/NiFe bilayers during film growth process

TitleEffect of ion-beam bombardment on exchange bias of NiO/NiFe bilayers during film growth process
Authors
Li, GLeung, CWWu, YJLin, KWLai, PTPong, PWT
Issue Date2011
Citation
The 8th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2011), Dalian, China, 19-22 September 2011, P-255 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/165285

 

DC FieldValueLanguage
dc.contributor.authorLi, Gen_US
dc.contributor.authorLeung, CWen_US
dc.contributor.authorWu, YJen_US
dc.contributor.authorLin, KWen_US
dc.contributor.authorLai, PTen_US
dc.contributor.authorPong, PWTen_US
dc.date.accessioned2012-09-20T08:16:41Z-
dc.date.available2012-09-20T08:16:41Z-
dc.date.issued2011en_US
dc.identifier.citationThe 8th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2011), Dalian, China, 19-22 September 2011, P-255en_US
dc.identifier.urihttp://hdl.handle.net/10722/165285-
dc.languageengen_US
dc.relation.ispartofAsian-European International Conference on Plasma Surface Engineering, AEPSE 2011en_US
dc.titleEffect of ion-beam bombardment on exchange bias of NiO/NiFe bilayers during film growth processen_US
dc.typeConference_Paperen_US
dc.identifier.emailLi, G: guijun@HKUSUC.hku.hken_US
dc.identifier.emailLai, PT: laip@eee.hku.hken_US
dc.identifier.emailPong, PWT: ppong@eee.hku.hk-
dc.identifier.authorityLai, PT=rp00130en_US
dc.identifier.authorityPong, PWT=rp00217en_US
dc.identifier.hkuros209737en_US

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