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Article: Robust level-set-based inverse lithography
| Title | Robust level-set-based inverse lithography | ||||||
|---|---|---|---|---|---|---|---|
| Authors | |||||||
| Keywords | Defocus Finite difference scheme Inverse lithography Layout patterns Level sets | ||||||
| Issue Date | 2011 | ||||||
| Publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org | ||||||
| Citation | Optics Express, 2011, v. 19 n. 6, p. 5511-5521 How to Cite? | ||||||
| Abstract | Level-set based inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem, interpreted with a time-dependent model, and then solved as a partial differential equation with finite difference schemes. This paper focuses on developing level-set based ILT for partially coherent systems, and upon that an expectation-orient optimization framework weighting the cost function by random process condition variables. These include defocus and aberration to enhance robustness of layout patterns against process variations. Results demonstrating the benefits of defocus-aberration-aware level-set based ILT are presented. © 2011 Optical Society of America. | ||||||
| Persistent Identifier | http://hdl.handle.net/10722/135098 | ||||||
| ISSN | 2021 Impact Factor: 3.833 2020 SCImago Journal Rankings: 1.394 | ||||||
| ISI Accession Number ID |
Funding Information: This work was supported in part by the Research Grants Council of the Hong Kong Special Administrative Region, China, under Projects HKU 7139/06E, 7174/07E and 7134/08E, and by the UGC Areas of Excellence project Theory, Modeling, and Simulation of Emerging Electronics. | ||||||
| References | |||||||
| Grants |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shen, Y | en_HK |
| dc.contributor.author | Jia, N | en_HK |
| dc.contributor.author | Wong, N | en_HK |
| dc.contributor.author | Lam, EY | en_HK |
| dc.date.accessioned | 2011-07-27T01:28:19Z | - |
| dc.date.available | 2011-07-27T01:28:19Z | - |
| dc.date.issued | 2011 | en_HK |
| dc.identifier.citation | Optics Express, 2011, v. 19 n. 6, p. 5511-5521 | en_HK |
| dc.identifier.issn | 1094-4087 | en_HK |
| dc.identifier.uri | http://hdl.handle.net/10722/135098 | - |
| dc.description.abstract | Level-set based inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem, interpreted with a time-dependent model, and then solved as a partial differential equation with finite difference schemes. This paper focuses on developing level-set based ILT for partially coherent systems, and upon that an expectation-orient optimization framework weighting the cost function by random process condition variables. These include defocus and aberration to enhance robustness of layout patterns against process variations. Results demonstrating the benefits of defocus-aberration-aware level-set based ILT are presented. © 2011 Optical Society of America. | en_HK |
| dc.language | eng | en_US |
| dc.publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org | en_HK |
| dc.relation.ispartof | Optics Express | en_HK |
| dc.rights | Optics Express. Copyright © Optical Society of America. | - |
| dc.rights | This paper was published in [Optics Express] and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: [http://www.opticsinfobase.org/abstract.cfm?URI=OE-19-6-5511]. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law. | - |
| dc.subject | Defocus | - |
| dc.subject | Finite difference scheme | - |
| dc.subject | Inverse lithography | - |
| dc.subject | Layout patterns | - |
| dc.subject | Level sets | - |
| dc.title | Robust level-set-based inverse lithography | en_HK |
| dc.type | Article | en_HK |
| dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1094-4087&volume=19&issue=6&spage=5511&epage=5521&date=2011&atitle=Robust+level-set-based+inverse+lithography | - |
| dc.identifier.email | Wong, N:nwong@eee.hku.hk | en_HK |
| dc.identifier.email | Lam, EY:elam@eee.hku.hk | en_HK |
| dc.identifier.authority | Wong, N=rp00190 | en_HK |
| dc.identifier.authority | Lam, EY=rp00131 | en_HK |
| dc.description.nature | published_or_final_version | en_US |
| dc.identifier.doi | 10.1364/OE.19.005511 | en_HK |
| dc.identifier.pmid | 21445189 | - |
| dc.identifier.scopus | eid_2-s2.0-79952591942 | en_HK |
| dc.identifier.hkuros | 186765 | en_US |
| dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-79952591942&selection=ref&src=s&origin=recordpage | en_HK |
| dc.identifier.volume | 19 | en_HK |
| dc.identifier.issue | 6 | en_HK |
| dc.identifier.spage | 5511 | en_HK |
| dc.identifier.epage | 5521 | en_HK |
| dc.identifier.isi | WOS:000288871300089 | - |
| dc.publisher.place | United States | en_HK |
| dc.relation.project | Imaging system modeling and image synthesis for resolution enhancement in optical lithography | - |
| dc.identifier.scopusauthorid | Shen, Y=12804295400 | en_HK |
| dc.identifier.scopusauthorid | Jia, N=34872289800 | en_HK |
| dc.identifier.scopusauthorid | Wong, N=35235551600 | en_HK |
| dc.identifier.scopusauthorid | Lam, EY=7102890004 | en_HK |
| dc.identifier.issnl | 1094-4087 | - |