Showing results 1 to 4 of 4
Title | Author(s) | Issue Date | |
---|---|---|---|
Charge-Trapping Characteristics of BaTiO3 with and without Nitridation for Nonvolatile Memory Applications Journal:Microelectronics Reliability | 2014 | ||
Charge-Trapping Characteristics of Fluorinated Thin ZrO2 Film for Nonvolatile Memory Applications Journal:Applied Physics Letters | 2014 | ||
Charge-trapping characteristics of niobium-doped La2O3 for nonvolatile memory applications Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits Proceedings | 2013 | ||
Nb-Doped La2O3 as Charge-Trapping Layer for Nonvolatile Memory Applications Journal:IEEE Transactions on Device and Materials Reliability | 2015 |