Showing results 17 to 21 of 21
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| Title | Author(s) | Issue Date | |
|---|---|---|---|
Sensitivity of 1D mask features towards aberration in photolithography Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | ||
Standard cell layout with grid-placed contacts Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | ||
| 2002 | |||
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks Proceeding/Conference:Proceedings of SPIE | 2002 | ||
| 2001 |