Showing results 1 to 2 of 2
Title | Author(s) | Issue Date | |
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Incorporating photomask shape uncertainty in computational lithography Proceeding/Conference:SPIE - International Society for Optical Engineering Proceedings | 2016 | ||
Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model Proceeding/Conference:Imaging and Applied Optics 2017 | 2017 |