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Conference Paper: Incorporating photomask shape uncertainty in computational lithography
Title | Incorporating photomask shape uncertainty in computational lithography |
---|---|
Authors | |
Keywords | Computational lithography Inverse lithography Random field Shape uncertainty |
Issue Date | 2016 |
Publisher | SPIE - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml?WT.svl=mddp2 |
Citation | Optical Microlithography XXIX, San Jose, CA., 23-25 February 2016. In Conference Proceedings, 2016, v. 9780, p. 97800Q:1-97800Q:10 How to Cite? |
Abstract | The lithographic performance of a photomask is sensitive to shape uncertainty caused by manufacturing and measurement errors. This work proposes incorporating the photomask shape uncertainty in computational lithography such as inverse lithography. The shape uncertainty of the photomask is quantitatively modeled as a random ?eld in a level-set method framework. With this, the shape uncertainty can be characterized by several parameters, making it computationally tractable to be incorporated in inverse lithography technique (ILT). Simulations are conducted to show the e€ectiveness of using this method to represent various kinds of shape variations. It is also demonstrated that incorporating the shape variation in ILT can reduce the mask error enhancement factor (MEEF) values of the optimized patterns, and improve the robustness of imaging performance against mask shape ?uctuation. © 2016 SPIE. |
Persistent Identifier | http://hdl.handle.net/10722/232286 |
ISBN | |
ISSN | 2023 SCImago Journal Rankings: 0.152 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Wu, X | - |
dc.contributor.author | Liu, S | - |
dc.contributor.author | Erdmann, A | - |
dc.contributor.author | Lam, EYM | - |
dc.date.accessioned | 2016-09-20T05:28:58Z | - |
dc.date.available | 2016-09-20T05:28:58Z | - |
dc.date.issued | 2016 | - |
dc.identifier.citation | Optical Microlithography XXIX, San Jose, CA., 23-25 February 2016. In Conference Proceedings, 2016, v. 9780, p. 97800Q:1-97800Q:10 | - |
dc.identifier.isbn | 978-151060015-7 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | http://hdl.handle.net/10722/232286 | - |
dc.description.abstract | The lithographic performance of a photomask is sensitive to shape uncertainty caused by manufacturing and measurement errors. This work proposes incorporating the photomask shape uncertainty in computational lithography such as inverse lithography. The shape uncertainty of the photomask is quantitatively modeled as a random ?eld in a level-set method framework. With this, the shape uncertainty can be characterized by several parameters, making it computationally tractable to be incorporated in inverse lithography technique (ILT). Simulations are conducted to show the e€ectiveness of using this method to represent various kinds of shape variations. It is also demonstrated that incorporating the shape variation in ILT can reduce the mask error enhancement factor (MEEF) values of the optimized patterns, and improve the robustness of imaging performance against mask shape ?uctuation. © 2016 SPIE. | - |
dc.language | eng | - |
dc.publisher | SPIE - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml?WT.svl=mddp2 | - |
dc.relation.ispartof | SPIE - International Society for Optical Engineering Proceedings | - |
dc.rights | Copyright 2016 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited. This article is available online at https://doi.org/10.1117/12.2220278 | - |
dc.subject | Computational lithography | - |
dc.subject | Inverse lithography | - |
dc.subject | Random field | - |
dc.subject | Shape uncertainty | - |
dc.title | Incorporating photomask shape uncertainty in computational lithography | - |
dc.type | Conference_Paper | - |
dc.identifier.email | Lam, EYM: elam@eee.hku.hk | - |
dc.identifier.authority | Lam, EYM=rp00131 | - |
dc.description.nature | published_or_final_version | - |
dc.identifier.doi | 10.1117/12.2220278 | - |
dc.identifier.scopus | eid_2-s2.0-84987837616 | - |
dc.identifier.hkuros | 264176 | - |
dc.identifier.volume | 9780 | - |
dc.identifier.spage | 97800Q:1 | - |
dc.identifier.epage | 97800Q:10 | - |
dc.identifier.isi | WOS:000391682900021 | - |
dc.publisher.place | United States | - |
dc.customcontrol.immutable | sml 161111 | - |
dc.identifier.issnl | 0277-786X | - |