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- Publisher Website: 10.1364/COSI.2017.CW1B.4
- Scopus: eid_2-s2.0-85026318981
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Conference Paper: Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model
| Title | Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model |
|---|---|
| Authors | |
| Issue Date | 2017 |
| Publisher | Optical Society of America. The Proceedings' web site is located at https://www.osapublishing.org/conference.cfm?meetingid=15 |
| Citation | OSA Topical Meeting in Computational Optical Sensing and Imaging, San Francisco, California, USA, 26–29 June 2017. In Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online), p. Paper CW1B.4 How to Cite? |
| Abstract | This paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF. © 2017 OSA |
| Description | Session: Novel Computational Imaging (CW1B) |
| Persistent Identifier | http://hdl.handle.net/10722/245533 |
| ISBN |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Wu, X | - |
| dc.contributor.author | Fuehner, T | - |
| dc.contributor.author | Erdmann, A | - |
| dc.contributor.author | Lam, EYM | - |
| dc.date.accessioned | 2017-09-18T02:12:23Z | - |
| dc.date.available | 2017-09-18T02:12:23Z | - |
| dc.date.issued | 2017 | - |
| dc.identifier.citation | OSA Topical Meeting in Computational Optical Sensing and Imaging, San Francisco, California, USA, 26–29 June 2017. In Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online), p. Paper CW1B.4 | - |
| dc.identifier.isbn | 978-1-943580-29-3 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/245533 | - |
| dc.description | Session: Novel Computational Imaging (CW1B) | - |
| dc.description.abstract | This paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF. © 2017 OSA | - |
| dc.language | eng | - |
| dc.publisher | Optical Society of America. The Proceedings' web site is located at https://www.osapublishing.org/conference.cfm?meetingid=15 | - |
| dc.relation.ispartof | Imaging and Applied Optics 2017 | - |
| dc.rights | Imaging and Applied Optics 2017. Copyright © Optical Society of America. | - |
| dc.title | Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model | - |
| dc.type | Conference_Paper | - |
| dc.identifier.email | Lam, EYM: elam@eee.hku.hk | - |
| dc.identifier.authority | Lam, EYM=rp00131 | - |
| dc.identifier.doi | 10.1364/COSI.2017.CW1B.4 | - |
| dc.identifier.scopus | eid_2-s2.0-85026318981 | - |
| dc.identifier.hkuros | 277493 | - |
| dc.identifier.spage | Paper CW1B.4 | - |
| dc.identifier.epage | Paper CW1B.4 | - |
| dc.publisher.place | United States | - |