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Conference Paper: Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

TitleLevet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model
Authors
Issue Date2017
PublisherOptical Society of America. The Proceedings' web site is located at https://www.osapublishing.org/conference.cfm?meetingid=15
Citation
OSA Topical Meeting in Computational Optical Sensing and Imaging, San Francisco, California, USA, 26–29 June 2017. In Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online), p. Paper CW1B.4 How to Cite?
AbstractThis paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF. © 2017 OSA
DescriptionSession: Novel Computational Imaging (CW1B)
Persistent Identifierhttp://hdl.handle.net/10722/245533
ISBN

 

DC FieldValueLanguage
dc.contributor.authorWu, X-
dc.contributor.authorFuehner, T-
dc.contributor.authorErdmann, A-
dc.contributor.authorLam, EYM-
dc.date.accessioned2017-09-18T02:12:23Z-
dc.date.available2017-09-18T02:12:23Z-
dc.date.issued2017-
dc.identifier.citationOSA Topical Meeting in Computational Optical Sensing and Imaging, San Francisco, California, USA, 26–29 June 2017. In Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online), p. Paper CW1B.4-
dc.identifier.isbn978-1-943580-29-3-
dc.identifier.urihttp://hdl.handle.net/10722/245533-
dc.descriptionSession: Novel Computational Imaging (CW1B)-
dc.description.abstractThis paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF. © 2017 OSA-
dc.languageeng-
dc.publisherOptical Society of America. The Proceedings' web site is located at https://www.osapublishing.org/conference.cfm?meetingid=15-
dc.relation.ispartofImaging and Applied Optics 2017-
dc.rightsImaging and Applied Optics 2017. Copyright © Optical Society of America.-
dc.titleLevet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model-
dc.typeConference_Paper-
dc.identifier.emailLam, EYM: elam@eee.hku.hk-
dc.identifier.authorityLam, EYM=rp00131-
dc.identifier.doi10.1364/COSI.2017.CW1B.4-
dc.identifier.hkuros277493-
dc.identifier.spagePaper CW1B.4-
dc.identifier.epagePaper CW1B.4-
dc.publisher.placeUnited States-

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