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Conference Paper: Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

TitleLevet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model
Authors
Issue Date2017
Citation
OSA Topical Meeting in Computational Optical Sensing and Imaging How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/245533

 

DC FieldValueLanguage
dc.contributor.authorWU, X-
dc.contributor.authorFuehner, T-
dc.contributor.authorErdmann, A-
dc.contributor.authorLam, EYM-
dc.date.accessioned2017-09-18T02:12:23Z-
dc.date.available2017-09-18T02:12:23Z-
dc.date.issued2017-
dc.identifier.citationOSA Topical Meeting in Computational Optical Sensing and Imaging-
dc.identifier.urihttp://hdl.handle.net/10722/245533-
dc.languageeng-
dc.relation.ispartofOSA Topical Meeting in Computational Optical Sensing and Imaging-
dc.titleLevet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model-
dc.typeConference_Paper-
dc.identifier.emailLam, EYM: elam@eee.hku.hk-
dc.identifier.authorityLam, EYM=rp00131-
dc.identifier.hkuros277493-

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