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Article: Electrical control of parametric processes in silicon waveguides

TitleElectrical control of parametric processes in silicon waveguides
Authors
Tsia, KKFathpour, SJalali, B
KeywordsChemicals And Cas Registry Numbers
Issue Date2008
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2008, v. 16 n. 13, p. 9838-9843 How to Cite?
DOI: http://dx.doi.org/10.1364/OE.16.009838
AbstractWe demonstrate electrical tuning of phase mismatch in silicon wavelength converters. Active control of birefringence induced by a thin-film piezoelectric transducer integrated on top of the waveguides is used for dispersion engineering. The technology provides a solution for compensating the phase mismatch caused by fabrication errors in integrated waveguides. It also offers a mean to dynamically control the relative dispersion between interacting waves and hence, to introduce electronic control of optical parametric processes. © 2008 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/91310
ISSN
1094-4087
2021 Impact Factor: 3.833
2020 SCImago Journal Rankings: 1.394
ISI Accession Number ID
WOS:000257563900065
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorTsia, KKen_HK
dc.contributor.authorFathpour, Sen_HK
dc.contributor.authorJalali, Ben_HK
dc.date.accessioned2010-09-17T10:16:49Z-
dc.date.available2010-09-17T10:16:49Z-
dc.date.issued2008en_HK
dc.identifier.citationOptics Express, 2008, v. 16 n. 13, p. 9838-9843en_HK
dc.identifier.issn1094-4087en_HK
dc.identifier.urihttp://hdl.handle.net/10722/91310-
dc.description.abstractWe demonstrate electrical tuning of phase mismatch in silicon wavelength converters. Active control of birefringence induced by a thin-film piezoelectric transducer integrated on top of the waveguides is used for dispersion engineering. The technology provides a solution for compensating the phase mismatch caused by fabrication errors in integrated waveguides. It also offers a mean to dynamically control the relative dispersion between interacting waves and hence, to introduce electronic control of optical parametric processes. © 2008 Optical Society of America.en_HK
dc.languageengen_HK
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.orgen_HK
dc.relation.ispartofOptics Expressen_HK
dc.subjectChemicals And Cas Registry Numbersen_HK
dc.subject.meshComputer Simulationen_HK
dc.subject.meshElectromagnetic Fieldsen_HK
dc.subject.meshElectronics - instrumentationen_HK
dc.subject.meshEquipment Designen_HK
dc.subject.meshEquipment Failure Analysisen_HK
dc.subject.meshLighten_HK
dc.subject.meshModels, Theoreticalen_HK
dc.subject.meshOptics and Photonics - instrumentationen_HK
dc.subject.meshRefractometry - instrumentationen_HK
dc.subject.meshScattering, Radiationen_HK
dc.subject.meshSilicon - chemistry - radiation effectsen_HK
dc.titleElectrical control of parametric processes in silicon waveguidesen_HK
dc.typeArticleen_HK
dc.identifier.emailTsia, KK:tsia@hku.hken_HK
dc.identifier.authorityTsia, KK=rp01389en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1364/OE.16.009838en_HK
dc.identifier.pmid18575553-
dc.identifier.scopuseid_2-s2.0-46149100282en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-46149100282&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume16en_HK
dc.identifier.issue13en_HK
dc.identifier.spage9838en_HK
dc.identifier.epage9843en_HK
dc.identifier.isiWOS:000257563900065-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridTsia, KK=6506659574en_HK
dc.identifier.scopusauthoridFathpour, S=9738012600en_HK
dc.identifier.scopusauthoridJalali, B=7004889917en_HK
dc.identifier.issnl1094-4087-

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