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Article: In vitro corrosion behavior of TiN layer produced on orthopedic nickel-titanium shape memory alloy by nitrogen plasma immersion ion implantation using different frequencies
Title | In vitro corrosion behavior of TiN layer produced on orthopedic nickel-titanium shape memory alloy by nitrogen plasma immersion ion implantation using different frequencies |
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Authors | |
Keywords | Corrosion resistance Frequency NiTi Plasma immersion ion implantation |
Issue Date | 2008 |
Publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/surfcoat |
Citation | Surface And Coatings Technology, 2008, v. 202 n. 11, p. 2463-2466 How to Cite? |
Abstract | In the present work, the NiTi surface was modified by nitrogen plasma immersion ion implantation (PIII) in an effort to improve the corrosion resistance and mitigate nickel release from the materials. The implanted nitrogen depths and thicknesses of the surface TiN barrier layers were varied by changing the pulsing frequencies during PIII. In order to determine the optimal parameters including the pulsing frequencies, electrochemical tests including open circuit potential (OCP) measurements and potentiodynamic polarization tests were conducted on the untreated and N-implanted NiTi in simulated body fluids (SBF). Our results reveal that the nitride layer produced using a frequency of 50 Hz has the best stability under the OCP conditions and the TiN layer produced using 200 Hz has the highest potentiodynamic stability after immersion in SBF for a long time. The observation can be correlated to the temperature during PIII and the thickness of TiN layer. The TiN layer on the NiTi surface favors deposition of Ca-P composites thereby compensating for the instability of the TiN layer produced at a higher frequency. © 2007 Elsevier B.V. All rights reserved. |
Persistent Identifier | http://hdl.handle.net/10722/79496 |
ISSN | 2023 Impact Factor: 5.3 2023 SCImago Journal Rankings: 1.034 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Liu, XM | en_HK |
dc.contributor.author | Wu, SL | en_HK |
dc.contributor.author | Chu, PK | en_HK |
dc.contributor.author | Chung, CY | en_HK |
dc.contributor.author | Chu, CL | en_HK |
dc.contributor.author | Chan, YL | en_HK |
dc.contributor.author | Yeung, KWK | en_HK |
dc.contributor.author | Lu, WW | en_HK |
dc.contributor.author | Cheung, KMC | en_HK |
dc.contributor.author | Luk, KDK | en_HK |
dc.date.accessioned | 2010-09-06T07:55:20Z | - |
dc.date.available | 2010-09-06T07:55:20Z | - |
dc.date.issued | 2008 | en_HK |
dc.identifier.citation | Surface And Coatings Technology, 2008, v. 202 n. 11, p. 2463-2466 | en_HK |
dc.identifier.issn | 0257-8972 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/79496 | - |
dc.description.abstract | In the present work, the NiTi surface was modified by nitrogen plasma immersion ion implantation (PIII) in an effort to improve the corrosion resistance and mitigate nickel release from the materials. The implanted nitrogen depths and thicknesses of the surface TiN barrier layers were varied by changing the pulsing frequencies during PIII. In order to determine the optimal parameters including the pulsing frequencies, electrochemical tests including open circuit potential (OCP) measurements and potentiodynamic polarization tests were conducted on the untreated and N-implanted NiTi in simulated body fluids (SBF). Our results reveal that the nitride layer produced using a frequency of 50 Hz has the best stability under the OCP conditions and the TiN layer produced using 200 Hz has the highest potentiodynamic stability after immersion in SBF for a long time. The observation can be correlated to the temperature during PIII and the thickness of TiN layer. The TiN layer on the NiTi surface favors deposition of Ca-P composites thereby compensating for the instability of the TiN layer produced at a higher frequency. © 2007 Elsevier B.V. All rights reserved. | en_HK |
dc.language | eng | en_HK |
dc.publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/surfcoat | en_HK |
dc.relation.ispartof | Surface and Coatings Technology | en_HK |
dc.subject | Corrosion resistance | en_HK |
dc.subject | Frequency | en_HK |
dc.subject | NiTi | en_HK |
dc.subject | Plasma immersion ion implantation | en_HK |
dc.title | In vitro corrosion behavior of TiN layer produced on orthopedic nickel-titanium shape memory alloy by nitrogen plasma immersion ion implantation using different frequencies | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0257-8972&volume=202&spage=2463&epage=1466&date=2008&atitle=In+vitro+corrosion+behavior+of+TiN+layer+produced+on+orthopedic+nickel-titanium+shape+memory+alloy+by+nitrogen+plasma+immersion+ion+implantation+using+different+frequencies | en_HK |
dc.identifier.email | Yeung, KWK:wkkyeung@hkucc.hku.hk | en_HK |
dc.identifier.email | Lu, WW:wwlu@hku.hk | en_HK |
dc.identifier.email | Cheung, KMC:cheungmc@hku.hk | en_HK |
dc.identifier.email | Luk, KDK:hcm21000@hku.hk | en_HK |
dc.identifier.authority | Yeung, KWK=rp00309 | en_HK |
dc.identifier.authority | Lu, WW=rp00411 | en_HK |
dc.identifier.authority | Cheung, KMC=rp00387 | en_HK |
dc.identifier.authority | Luk, KDK=rp00333 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.surfcoat.2007.08.017 | en_HK |
dc.identifier.scopus | eid_2-s2.0-38949091088 | en_HK |
dc.identifier.hkuros | 145982 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-38949091088&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 202 | en_HK |
dc.identifier.issue | 11 | en_HK |
dc.identifier.spage | 2463 | en_HK |
dc.identifier.epage | 2466 | en_HK |
dc.identifier.isi | WOS:000253930900048 | - |
dc.publisher.place | Switzerland | en_HK |
dc.identifier.scopusauthorid | Liu, XM=8408205200 | en_HK |
dc.identifier.scopusauthorid | Wu, SL=15125218800 | en_HK |
dc.identifier.scopusauthorid | Chu, PK=36040705700 | en_HK |
dc.identifier.scopusauthorid | Chung, CY=8100842800 | en_HK |
dc.identifier.scopusauthorid | Chu, CL=7404345713 | en_HK |
dc.identifier.scopusauthorid | Chan, YL=8250546500 | en_HK |
dc.identifier.scopusauthorid | Yeung, KWK=13309584700 | en_HK |
dc.identifier.scopusauthorid | Lu, WW=7404215221 | en_HK |
dc.identifier.scopusauthorid | Cheung, KMC=7402406754 | en_HK |
dc.identifier.scopusauthorid | Luk, KDK=7201921573 | en_HK |
dc.identifier.issnl | 0257-8972 | - |