Showing results 1 to 13 of 13
Title | Author(s) | Issue Date | |
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Alternating phase-shifting mask design for low aberration sensitivity Journal:Journal of Microlithography, Microfabrication, and Microsystems | 2005 | ||
Alternating phase-shifting mask design for low aberration sensitivity Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2004 | ||
Forbidden area avoidance with spacing technique for layout optimization Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2004 | ||
2008 | |||
2003 | |||
Nebulous hotspot and algorithm variability in computation lithography Journal:Journal of Micro/Nanolithography, MEMS, and MOEMS | 2010 | ||
Optimization of photomask design for reducing aberration-induced placement error Journal:IEEE Transactions on Semiconductor Manufacturing | 2006 | ||
Performance optimization for gridded-layout standard cells Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2004 | ||
Regularization of inverse photomask synthesis to enhance manufacturability Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2009 | ||
Robust mask design with defocus variation using inverse synthesis Proceeding/Conference:Proceedings of SPIE | 2008 | ||
Standard cell design with regularly-placed contacts and gates Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering | 2004 | ||
Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates Journal:Journal of Microlithography, Microfabrication, and Microsystems | 2005 | ||
Standard cell layout with regular contact placement Journal:IEEE Transactions on Semiconductor Manufacturing | 2004 |