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Article: High-density uniformly aligned silicon nanotip arrays and their enhanced field emission characteristics

TitleHigh-density uniformly aligned silicon nanotip arrays and their enhanced field emission characteristics
Authors
KeywordsA. Semiconductor
D. Electronic transport
Issue Date2003
Citation
Solid State Communications, 2003, v. 125, n. 3-4, p. 185-188 How to Cite?
AbstractHigh-density (∼ 108/cm2), uniformly aligned silicon nanotip arrays are synthesized by a plasma-assisted hot-filament chemical vapor deposition process using mixed gases composed of hydrogen, nitrogen and methane. The silicon nanotips grow along 〈112〉, and are coated in situ with a ∼ 3 nm thick amorphous carbon film by increasing the methane concentration in the source gases. In comparison to the uncoated silicon nanotips arrays, the coated tips have enhanced field emission properties with a turn-on field of 1.6 V/μm (for 10 μA/cm2) and threshold field of 3 V/μm (for 10 mA/cm2), suggesting their potential applications for flat panel displays. © 2003 Elsevier Science Ltd. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/359766
ISSN
2023 Impact Factor: 2.1
2023 SCImago Journal Rankings: 0.414

 

DC FieldValueLanguage
dc.contributor.authorBai, X. D.-
dc.contributor.authorZhi, C. Y.-
dc.contributor.authorLiu, S.-
dc.contributor.authorWang, E. G.-
dc.contributor.authorWang, Z. L.-
dc.date.accessioned2025-09-10T09:03:10Z-
dc.date.available2025-09-10T09:03:10Z-
dc.date.issued2003-
dc.identifier.citationSolid State Communications, 2003, v. 125, n. 3-4, p. 185-188-
dc.identifier.issn0038-1098-
dc.identifier.urihttp://hdl.handle.net/10722/359766-
dc.description.abstractHigh-density (∼ 10<sup>8</sup>/cm<sup>2</sup>), uniformly aligned silicon nanotip arrays are synthesized by a plasma-assisted hot-filament chemical vapor deposition process using mixed gases composed of hydrogen, nitrogen and methane. The silicon nanotips grow along 〈112〉, and are coated in situ with a ∼ 3 nm thick amorphous carbon film by increasing the methane concentration in the source gases. In comparison to the uncoated silicon nanotips arrays, the coated tips have enhanced field emission properties with a turn-on field of 1.6 V/μm (for 10 μA/cm<sup>2</sup>) and threshold field of 3 V/μm (for 10 mA/cm<sup>2</sup>), suggesting their potential applications for flat panel displays. © 2003 Elsevier Science Ltd. All rights reserved.-
dc.languageeng-
dc.relation.ispartofSolid State Communications-
dc.subjectA. Semiconductor-
dc.subjectD. Electronic transport-
dc.titleHigh-density uniformly aligned silicon nanotip arrays and their enhanced field emission characteristics-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/S0038-1098(02)00720-2-
dc.identifier.scopuseid_2-s2.0-0037220620-
dc.identifier.volume125-
dc.identifier.issue3-4-
dc.identifier.spage185-
dc.identifier.epage188-

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