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Article: 2.5 kV Vertical Ga2O3Schottky Rectifier With Graded Junction Termination Extension

Title2.5 kV Vertical Ga<inf>2</inf>O<inf>3</inf>Schottky Rectifier With Graded Junction Termination Extension
Authors
Keywordsbreakdown voltage
capacitance
gallium oxide
junction termination extension
nickel oxide
on-resistance
Power electronics
ultra-wide bandgap
Issue Date2023
Citation
IEEE Electron Device Letters, 2023, v. 44, n. 2, p. 221-224 How to Cite?
AbstractThis work demonstrates vertical Ga2O3 Schottky barrier diodes (SBDs) with a novel junction termination extension (JTE) comprising multiple layers of sputtered p-type nickel oxide (NiO). The NiO layers have the varied lengths to enable a graded decrease in effective charge density away from the main junction. The fabrication of this JTE obviates the etch or implantation and shows good throughput. The fabricated Ga2O3 SBDs exhibit a forward voltage below 1.9 V at the current density of 100 A/cm2, a differential specific on-resistance of 5.9mΩ m2, and a breakdown voltage over 2.5 kV. The Baliga's figure of merit (FOM) exceeds 1 GW/cm2 and is among the highest in multi-kilovolt Ga2O3 SBDs. Besides, the capacitance of the JTE region is extracted, allowing for evaluation of the capacitance, charge, and switching FOM of 1.7 kV-class Ga2O3 SBDs with varied current ratings. The results show good promise of Ga2O3 SBDs for kilovolt power electronics.
Persistent Identifierhttp://hdl.handle.net/10722/352349
ISSN
2023 Impact Factor: 4.1
2023 SCImago Journal Rankings: 1.250
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorWang, Boyan-
dc.contributor.authorXiao, Ming-
dc.contributor.authorSpencer, Joseph-
dc.contributor.authorQin, Yuan-
dc.contributor.authorSasaki, Kohei-
dc.contributor.authorTadjer, Marko J.-
dc.contributor.authorZhang, Yuhao-
dc.date.accessioned2024-12-16T03:58:24Z-
dc.date.available2024-12-16T03:58:24Z-
dc.date.issued2023-
dc.identifier.citationIEEE Electron Device Letters, 2023, v. 44, n. 2, p. 221-224-
dc.identifier.issn0741-3106-
dc.identifier.urihttp://hdl.handle.net/10722/352349-
dc.description.abstractThis work demonstrates vertical Ga2O3 Schottky barrier diodes (SBDs) with a novel junction termination extension (JTE) comprising multiple layers of sputtered p-type nickel oxide (NiO). The NiO layers have the varied lengths to enable a graded decrease in effective charge density away from the main junction. The fabrication of this JTE obviates the etch or implantation and shows good throughput. The fabricated Ga2O3 SBDs exhibit a forward voltage below 1.9 V at the current density of 100 A/cm2, a differential specific on-resistance of 5.9mΩ m2, and a breakdown voltage over 2.5 kV. The Baliga's figure of merit (FOM) exceeds 1 GW/cm2 and is among the highest in multi-kilovolt Ga2O3 SBDs. Besides, the capacitance of the JTE region is extracted, allowing for evaluation of the capacitance, charge, and switching FOM of 1.7 kV-class Ga2O3 SBDs with varied current ratings. The results show good promise of Ga2O3 SBDs for kilovolt power electronics.-
dc.languageeng-
dc.relation.ispartofIEEE Electron Device Letters-
dc.subjectbreakdown voltage-
dc.subjectcapacitance-
dc.subjectgallium oxide-
dc.subjectjunction termination extension-
dc.subjectnickel oxide-
dc.subjecton-resistance-
dc.subjectPower electronics-
dc.subjectultra-wide bandgap-
dc.title2.5 kV Vertical Ga<inf>2</inf>O<inf>3</inf>Schottky Rectifier With Graded Junction Termination Extension-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1109/LED.2022.3229222-
dc.identifier.scopuseid_2-s2.0-85148239114-
dc.identifier.volume44-
dc.identifier.issue2-
dc.identifier.spage221-
dc.identifier.epage224-
dc.identifier.eissn1558-0563-
dc.identifier.isiWOS:000966899200001-

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