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- Publisher Website: 10.1109/LED.2022.3229222
- Scopus: eid_2-s2.0-85148239114
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Article: 2.5 kV Vertical Ga2 O3 Schottky Rectifier With Graded Junction Termination Extension
| Title | 2.5 kV Vertical Ga<inf>2</inf>O<inf>3</inf>Schottky Rectifier With Graded Junction Termination Extension |
|---|---|
| Authors | |
| Keywords | breakdown voltage capacitance gallium oxide junction termination extension nickel oxide on-resistance Power electronics ultra-wide bandgap |
| Issue Date | 2023 |
| Citation | IEEE Electron Device Letters, 2023, v. 44, n. 2, p. 221-224 How to Cite? |
| Abstract | This work demonstrates vertical Ga2O3 Schottky barrier diodes (SBDs) with a novel junction termination extension (JTE) comprising multiple layers of sputtered p-type nickel oxide (NiO). The NiO layers have the varied lengths to enable a graded decrease in effective charge density away from the main junction. The fabrication of this JTE obviates the etch or implantation and shows good throughput. The fabricated Ga2O3 SBDs exhibit a forward voltage below 1.9 V at the current density of 100 A/cm2, a differential specific on-resistance of 5.9mΩ m2, and a breakdown voltage over 2.5 kV. The Baliga's figure of merit (FOM) exceeds 1 GW/cm2 and is among the highest in multi-kilovolt Ga2O3 SBDs. Besides, the capacitance of the JTE region is extracted, allowing for evaluation of the capacitance, charge, and switching FOM of 1.7 kV-class Ga2O3 SBDs with varied current ratings. The results show good promise of Ga2O3 SBDs for kilovolt power electronics. |
| Persistent Identifier | http://hdl.handle.net/10722/352349 |
| ISSN | 2023 Impact Factor: 4.1 2023 SCImago Journal Rankings: 1.250 |
| ISI Accession Number ID |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Wang, Boyan | - |
| dc.contributor.author | Xiao, Ming | - |
| dc.contributor.author | Spencer, Joseph | - |
| dc.contributor.author | Qin, Yuan | - |
| dc.contributor.author | Sasaki, Kohei | - |
| dc.contributor.author | Tadjer, Marko J. | - |
| dc.contributor.author | Zhang, Yuhao | - |
| dc.date.accessioned | 2024-12-16T03:58:24Z | - |
| dc.date.available | 2024-12-16T03:58:24Z | - |
| dc.date.issued | 2023 | - |
| dc.identifier.citation | IEEE Electron Device Letters, 2023, v. 44, n. 2, p. 221-224 | - |
| dc.identifier.issn | 0741-3106 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/352349 | - |
| dc.description.abstract | This work demonstrates vertical Ga2O3 Schottky barrier diodes (SBDs) with a novel junction termination extension (JTE) comprising multiple layers of sputtered p-type nickel oxide (NiO). The NiO layers have the varied lengths to enable a graded decrease in effective charge density away from the main junction. The fabrication of this JTE obviates the etch or implantation and shows good throughput. The fabricated Ga2O3 SBDs exhibit a forward voltage below 1.9 V at the current density of 100 A/cm2, a differential specific on-resistance of 5.9mΩ m2, and a breakdown voltage over 2.5 kV. The Baliga's figure of merit (FOM) exceeds 1 GW/cm2 and is among the highest in multi-kilovolt Ga2O3 SBDs. Besides, the capacitance of the JTE region is extracted, allowing for evaluation of the capacitance, charge, and switching FOM of 1.7 kV-class Ga2O3 SBDs with varied current ratings. The results show good promise of Ga2O3 SBDs for kilovolt power electronics. | - |
| dc.language | eng | - |
| dc.relation.ispartof | IEEE Electron Device Letters | - |
| dc.subject | breakdown voltage | - |
| dc.subject | capacitance | - |
| dc.subject | gallium oxide | - |
| dc.subject | junction termination extension | - |
| dc.subject | nickel oxide | - |
| dc.subject | on-resistance | - |
| dc.subject | Power electronics | - |
| dc.subject | ultra-wide bandgap | - |
| dc.title | 2.5 kV Vertical Ga<inf>2</inf>O<inf>3</inf>Schottky Rectifier With Graded Junction Termination Extension | - |
| dc.type | Article | - |
| dc.description.nature | link_to_subscribed_fulltext | - |
| dc.identifier.doi | 10.1109/LED.2022.3229222 | - |
| dc.identifier.scopus | eid_2-s2.0-85148239114 | - |
| dc.identifier.volume | 44 | - |
| dc.identifier.issue | 2 | - |
| dc.identifier.spage | 221 | - |
| dc.identifier.epage | 224 | - |
| dc.identifier.eissn | 1558-0563 | - |
| dc.identifier.isi | WOS:000966899200001 | - |
