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- Publisher Website: 10.1016/j.mssp.2017.09.033
- Scopus: eid_2-s2.0-85035816994
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Article: Materials and processing issues in vertical GaN power electronics
Title | Materials and processing issues in vertical GaN power electronics |
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Authors | |
Keywords | Corner rounding Device processing Edge termination GaN-on-GaN Implantation P-GaN activation Power electronics Power transistor Rectifier Vertical GaN |
Issue Date | 2018 |
Citation | Materials Science in Semiconductor Processing, 2018, v. 78, p. 75-84 How to Cite? |
Abstract | Silicon-based power devices are reaching their fundamental performance limit. The use of wide-bandgap semiconductors with superior material properties over silicon offers the potential for power electronic systems with much higher power densities and higher conversion efficiency. GaN, with a high critical electric field and carrier mobility, is considered one of the most promising candidates for future high-power, high frequency and high temperature applications. High voltage transistors and diodes based on both lateral and vertical structures are of great interest for future power electronics. Particularly, vertical GaN power devices have recently attracted increasing attention due to their many unique properties. This paper reviews recent progress and key remaining challenges towards the development of high-performance vertical GaN transistors and diodes with emphasis on the materials and processing issues related to each device architecture. |
Persistent Identifier | http://hdl.handle.net/10722/352114 |
ISSN | 2023 Impact Factor: 4.2 2023 SCImago Journal Rankings: 0.732 |
DC Field | Value | Language |
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dc.contributor.author | Hu, Jie | - |
dc.contributor.author | Zhang, Yuhao | - |
dc.contributor.author | Sun, Min | - |
dc.contributor.author | Piedra, Daniel | - |
dc.contributor.author | Chowdhury, Nadim | - |
dc.contributor.author | Palacios, Tomás | - |
dc.date.accessioned | 2024-12-16T03:56:47Z | - |
dc.date.available | 2024-12-16T03:56:47Z | - |
dc.date.issued | 2018 | - |
dc.identifier.citation | Materials Science in Semiconductor Processing, 2018, v. 78, p. 75-84 | - |
dc.identifier.issn | 1369-8001 | - |
dc.identifier.uri | http://hdl.handle.net/10722/352114 | - |
dc.description.abstract | Silicon-based power devices are reaching their fundamental performance limit. The use of wide-bandgap semiconductors with superior material properties over silicon offers the potential for power electronic systems with much higher power densities and higher conversion efficiency. GaN, with a high critical electric field and carrier mobility, is considered one of the most promising candidates for future high-power, high frequency and high temperature applications. High voltage transistors and diodes based on both lateral and vertical structures are of great interest for future power electronics. Particularly, vertical GaN power devices have recently attracted increasing attention due to their many unique properties. This paper reviews recent progress and key remaining challenges towards the development of high-performance vertical GaN transistors and diodes with emphasis on the materials and processing issues related to each device architecture. | - |
dc.language | eng | - |
dc.relation.ispartof | Materials Science in Semiconductor Processing | - |
dc.subject | Corner rounding | - |
dc.subject | Device processing | - |
dc.subject | Edge termination | - |
dc.subject | GaN-on-GaN | - |
dc.subject | Implantation | - |
dc.subject | P-GaN activation | - |
dc.subject | Power electronics | - |
dc.subject | Power transistor | - |
dc.subject | Rectifier | - |
dc.subject | Vertical GaN | - |
dc.title | Materials and processing issues in vertical GaN power electronics | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.mssp.2017.09.033 | - |
dc.identifier.scopus | eid_2-s2.0-85035816994 | - |
dc.identifier.volume | 78 | - |
dc.identifier.spage | 75 | - |
dc.identifier.epage | 84 | - |