File Download

There are no files associated with this item.

  Links for fulltext
     (May Require Subscription)
Supplementary

Article: Experimental Demonstration of Dual-Band Nano-Electromechanical Valley-Hall Topological Metamaterials

TitleExperimental Demonstration of Dual-Band Nano-Electromechanical Valley-Hall Topological Metamaterials
Authors
Keywordsintegrated phononic circuits
nano-electromechanical systems
quantum valley-Hall effect
topological insulators
valley-momentum locking
Issue Date2021
Citation
Advanced Materials, 2021, v. 33, n. 10, article no. 2006521 How to Cite?
AbstractSuppression of undesired backscattering of very-high-frequency elastic signals has been considered as a grand challenge in integrated phononic circuits. Originating from condensed-matter physics, valley-Hall topological insulators provide an intriguing strategy to overcome this challenge. To date, phononic valley-Hall topological insulators have been demonstrated only in bulk acoustic and mechanical systems operating at relatively low frequencies. Here, an integrated nano-electromechanical valley-Hall topological insulator operating in the very-high-frequency regime is experimentally realized. Valley kink states that are backscattering-immune against sharp bends and exhibit the “valley-momentum locking” effect simultaneously in the fundamental (≈60 MHz) and second-order (≈120 MHz) frequency bands are demonstrated. It is further shown that the propagation directions of these dual-band valley kink states are always locked to their valley pseudospins. The results not only enable various applications in very-high-frequency integrated phononic circuits with enhanced robustness and capacity, but also open the door to experimental exploration of mechanical nonlinearities, particularly those involving the fundamental and second-order frequencies, in topologically nontrivial nanostructures.
Persistent Identifierhttp://hdl.handle.net/10722/351417
ISSN
2023 Impact Factor: 27.4
2023 SCImago Journal Rankings: 9.191

 

DC FieldValueLanguage
dc.contributor.authorMa, Jingwen-
dc.contributor.authorXi, Xiang-
dc.contributor.authorSun, Xiankai-
dc.date.accessioned2024-11-20T03:56:09Z-
dc.date.available2024-11-20T03:56:09Z-
dc.date.issued2021-
dc.identifier.citationAdvanced Materials, 2021, v. 33, n. 10, article no. 2006521-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10722/351417-
dc.description.abstractSuppression of undesired backscattering of very-high-frequency elastic signals has been considered as a grand challenge in integrated phononic circuits. Originating from condensed-matter physics, valley-Hall topological insulators provide an intriguing strategy to overcome this challenge. To date, phononic valley-Hall topological insulators have been demonstrated only in bulk acoustic and mechanical systems operating at relatively low frequencies. Here, an integrated nano-electromechanical valley-Hall topological insulator operating in the very-high-frequency regime is experimentally realized. Valley kink states that are backscattering-immune against sharp bends and exhibit the “valley-momentum locking” effect simultaneously in the fundamental (≈60 MHz) and second-order (≈120 MHz) frequency bands are demonstrated. It is further shown that the propagation directions of these dual-band valley kink states are always locked to their valley pseudospins. The results not only enable various applications in very-high-frequency integrated phononic circuits with enhanced robustness and capacity, but also open the door to experimental exploration of mechanical nonlinearities, particularly those involving the fundamental and second-order frequencies, in topologically nontrivial nanostructures.-
dc.languageeng-
dc.relation.ispartofAdvanced Materials-
dc.subjectintegrated phononic circuits-
dc.subjectnano-electromechanical systems-
dc.subjectquantum valley-Hall effect-
dc.subjecttopological insulators-
dc.subjectvalley-momentum locking-
dc.titleExperimental Demonstration of Dual-Band Nano-Electromechanical Valley-Hall Topological Metamaterials-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1002/adma.202006521-
dc.identifier.pmid33538079-
dc.identifier.scopuseid_2-s2.0-85100350346-
dc.identifier.volume33-
dc.identifier.issue10-
dc.identifier.spagearticle no. 2006521-
dc.identifier.epagearticle no. 2006521-
dc.identifier.eissn1521-4095-

Export via OAI-PMH Interface in XML Formats


OR


Export to Other Non-XML Formats