UV-Based Advanced Oxidation Processes for Antibiotic Resistance Control: Efficiency, Influencing Factors, and Energy Consumption

Abstract

Antibiotic resistant bacteria (ARB) with antibiotic resistance genes (ARGs) can reduce or eliminate the effectiveness of antibiotics and thus threaten human health. The United Nations Environment Programme considers antibiotic resistance the first of six emerging issues of concern. Advanced oxidation processes (AOPs) that combine ultraviolet (UV) irradiation and chemical oxidation (primarily chlorine, hydrogen peroxide, and persulfate) have attracted increasing interest as advanced water and wastewater treatment technologies. These integrated technologies have been reported to significantly elevate the efficiencies of ARB inactivation and ARG degradation compared with direct UV irradiation or chemical oxidation alone due to the generation of multiple reactive species. In this study, the performance and underlying mechanisms of UV/chlorine, UV/hydrogen peroxide, and UV/persulfate processes for controlling ARB and ARGs were reviewed based on recent studies. Factors affecting the process-specific efficiency in controlling ARB and ARGs were discussed, including biotic factors, oxidant dose, UV fluence, pH, and water matrix properties. In addition, the cost-effectiveness of the UV-based AOPs was evaluated using the concept of electrical energy per order. The UV/chlorine process exhibited a higher efficiency with lower energy consumption than other UV-based AOPs in the wastewater matrix, indicating its potential for ARB inactivation and ARG degradation in wastewater treatment. Further studies are required to address the trade-off between toxic byproduct formation and the energy efficiency of the UV/chlorine process in real wastewater to facilitate its optimization and application in the control of ARB and ARGs.