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Article: B20 Weyl Semimetal CoSi Film Fabricated by Flash-Lamp Annealing

TitleB20 Weyl Semimetal CoSi Film Fabricated by Flash-Lamp Annealing
Authors
Li, ZichaoYuan, YeHübner, RenéRebohle, LarsZhou, YanHelm, ManfredNielsch, KorneliusPrucnal, SlawomirZhou, Shengqiang
KeywordsCoSi
flash-lamp annealing
solid-phase epitaxy
thin film
Weyl semimetal
Issue Date28-Jun-2023
PublisherAmerican Chemical Society
Citation
ACS Applied Materials and Interfaces, 2023, v. 15, n. 25, p. 30517-30523 How to Cite?
DOI: http://dx.doi.org/10.1021/acsami.3c05634
Abstract

B20-CoSi is a newly discovered Weyl semimetal that crystallizes into a noncentrosymmetric crystal structure. However, the investigation of B20-CoSi has so far been focused on bulk materials, whereas the growth of thin films on technology-relevant substrates is a prerequisite for most practical applications. In this study, we have used millisecond-range flash-lamp annealing, a nonequilibrium solid-state reaction, to grow B20-CoSi thin films. By optimizing the annealing parameters, we were able to obtain thin films with a pure B20-CoSi phase. The magnetic and transport measurements indicate the appearance of the charge density wave and chiral anomaly. Our work presents a promising method for preparing thin films of most binary B20 transition-metal silicides, which are candidates for topological Weyl semimetals.


Persistent Identifierhttp://hdl.handle.net/10722/345548
ISSN
1944-8244
2023 Impact Factor: 8.3
2023 SCImago Journal Rankings: 2.058
ISI Accession Number ID
WOS:001011622700001

 

DC FieldValueLanguage
dc.contributor.authorLi, Zichao-
dc.contributor.authorYuan, Ye-
dc.contributor.authorHübner, René-
dc.contributor.authorRebohle, Lars-
dc.contributor.authorZhou, Yan-
dc.contributor.authorHelm, Manfred-
dc.contributor.authorNielsch, Kornelius-
dc.contributor.authorPrucnal, Slawomir-
dc.contributor.authorZhou, Shengqiang-
dc.date.accessioned2024-08-27T09:09:32Z-
dc.date.available2024-08-27T09:09:32Z-
dc.date.issued2023-06-28-
dc.identifier.citationACS Applied Materials and Interfaces, 2023, v. 15, n. 25, p. 30517-30523-
dc.identifier.issn1944-8244-
dc.identifier.urihttp://hdl.handle.net/10722/345548-
dc.description.abstract<p>B20-CoSi is a newly discovered Weyl semimetal that crystallizes into a noncentrosymmetric crystal structure. However, the investigation of B20-CoSi has so far been focused on bulk materials, whereas the growth of thin films on technology-relevant substrates is a prerequisite for most practical applications. In this study, we have used millisecond-range flash-lamp annealing, a nonequilibrium solid-state reaction, to grow B20-CoSi thin films. By optimizing the annealing parameters, we were able to obtain thin films with a pure B20-CoSi phase. The magnetic and transport measurements indicate the appearance of the charge density wave and chiral anomaly. Our work presents a promising method for preparing thin films of most binary B20 transition-metal silicides, which are candidates for topological Weyl semimetals.</p>-
dc.languageeng-
dc.publisherAmerican Chemical Society-
dc.relation.ispartofACS Applied Materials and Interfaces-
dc.rightsThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.-
dc.subjectCoSi-
dc.subjectflash-lamp annealing-
dc.subjectsolid-phase epitaxy-
dc.subjectthin film-
dc.subjectWeyl semimetal-
dc.titleB20 Weyl Semimetal CoSi Film Fabricated by Flash-Lamp Annealing-
dc.typeArticle-
dc.identifier.doi10.1021/acsami.3c05634-
dc.identifier.pmid37327253-
dc.identifier.scopuseid_2-s2.0-85164210526-
dc.identifier.volume15-
dc.identifier.issue25-
dc.identifier.spage30517-
dc.identifier.epage30523-
dc.identifier.eissn1944-8252-
dc.identifier.isiWOS:001011622700001-
dc.identifier.issnl1944-8244-

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