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- Publisher Website: 10.1038/s41378-020-00215-0
- Scopus: eid_2-s2.0-85096876739
- PMID: 34567715
- WOS: WOS:000596303600001
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Article: Gradient wettability induced by deterministically patterned nanostructures
Title | Gradient wettability induced by deterministically patterned nanostructures |
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Authors | |
Issue Date | 30-Nov-2020 |
Publisher | Springer Nature |
Citation | Microsystems & Nanoengineering, 2020, v. 6, n. 1 How to Cite? |
Abstract | We report a large-scale surface with continuously varying wettability induced by ordered gradient nanostructures. The gradient pattern is generated from nonuniform interference lithography by utilizing the Gaussian-shaped intensity distribution of two coherent laser beams. We also develop a facile fabrication method to directly transfer a photoresist pattern into an ultraviolet (UV)-cured high-strength replication molding material, which eliminates the need for high-cost reactive ion etching and e-beam evaporation during the mold fabrication process. This facile mold is then used for the reproducible production of surfaces with gradient wettability using thermal-nanoimprint lithography (NIL). In addition, the wetting behavior of water droplets on the surface with the gradient nanostructures and therefore gradient wettability is investigated. A hybrid wetting model is proposed and theoretically captures the contact angle measurement results, shedding light on the wetting behavior of a liquid on structures patterned at the nanoscale. A new method for producing wettability gradientsA new approach developed by researchers in China makes it possible to manufacture materials with continuously varying wettability along their surface. A team led by Wen-Di Li of the University of Hong Kong and Xing Cheng of Southern University of Science and Technology came up with an approach that begins with interference lithography to create a variable intensity pattern with circular symmetry. This created nanostructures in a photoresist, which then served as the base for fabricating a UV-cured mold, which could then be used to transfer the pattern onto a polymer. This approach eliminates the need for costly fabrication processes. The team used this approach to generate a surface with a wettability gradient and investigate its properties, which they found were best described by a hybrid combination of the classic Wenzel and Cassie wetting models. |
Persistent Identifier | http://hdl.handle.net/10722/337826 |
ISSN | |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Min, SY | - |
dc.contributor.author | Li, SJ | - |
dc.contributor.author | Zhu, ZY | - |
dc.contributor.author | Li, W | - |
dc.contributor.author | Tang, X | - |
dc.contributor.author | Liang, CW | - |
dc.contributor.author | Wang, LQ | - |
dc.contributor.author | Cheng, X | - |
dc.contributor.author | Li, WD | - |
dc.date.accessioned | 2024-03-11T10:24:11Z | - |
dc.date.available | 2024-03-11T10:24:11Z | - |
dc.date.issued | 2020-11-30 | - |
dc.identifier.citation | Microsystems & Nanoengineering, 2020, v. 6, n. 1 | - |
dc.identifier.issn | 2096-1030 | - |
dc.identifier.uri | http://hdl.handle.net/10722/337826 | - |
dc.description.abstract | We report a large-scale surface with continuously varying wettability induced by ordered gradient nanostructures. The gradient pattern is generated from nonuniform interference lithography by utilizing the Gaussian-shaped intensity distribution of two coherent laser beams. We also develop a facile fabrication method to directly transfer a photoresist pattern into an ultraviolet (UV)-cured high-strength replication molding material, which eliminates the need for high-cost reactive ion etching and e-beam evaporation during the mold fabrication process. This facile mold is then used for the reproducible production of surfaces with gradient wettability using thermal-nanoimprint lithography (NIL). In addition, the wetting behavior of water droplets on the surface with the gradient nanostructures and therefore gradient wettability is investigated. A hybrid wetting model is proposed and theoretically captures the contact angle measurement results, shedding light on the wetting behavior of a liquid on structures patterned at the nanoscale. A new method for producing wettability gradientsA new approach developed by researchers in China makes it possible to manufacture materials with continuously varying wettability along their surface. A team led by Wen-Di Li of the University of Hong Kong and Xing Cheng of Southern University of Science and Technology came up with an approach that begins with interference lithography to create a variable intensity pattern with circular symmetry. This created nanostructures in a photoresist, which then served as the base for fabricating a UV-cured mold, which could then be used to transfer the pattern onto a polymer. This approach eliminates the need for costly fabrication processes. The team used this approach to generate a surface with a wettability gradient and investigate its properties, which they found were best described by a hybrid combination of the classic Wenzel and Cassie wetting models. | - |
dc.language | eng | - |
dc.publisher | Springer Nature | - |
dc.relation.ispartof | Microsystems & Nanoengineering | - |
dc.rights | This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License. | - |
dc.title | Gradient wettability induced by deterministically patterned nanostructures | - |
dc.type | Article | - |
dc.identifier.doi | 10.1038/s41378-020-00215-0 | - |
dc.identifier.pmid | 34567715 | - |
dc.identifier.scopus | eid_2-s2.0-85096876739 | - |
dc.identifier.volume | 6 | - |
dc.identifier.issue | 1 | - |
dc.identifier.eissn | 2055-7434 | - |
dc.identifier.isi | WOS:000596303600001 | - |
dc.publisher.place | LONDON | - |
dc.identifier.issnl | 2055-7434 | - |