File Download
Supplementary
-
Citations:
- Appears in Collections:
postgraduate thesis: Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation
| Title | Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation |
|---|---|
| Authors | |
| Advisors | Advisor(s):Lai, PT |
| Issue Date | 2002 |
| Publisher | The University of Hong Kong (Pokfulam, Hong Kong) |
| Citation | Or, C. D. [柯展東]. (2002). Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3122659 |
| Degree | Master of Philosophy |
| Subject | Thin film transistors. Dielectrics. |
| Dept/Program | Electrical and Electronic Engineering |
| Persistent Identifier | http://hdl.handle.net/10722/33659 |
| HKU Library Item ID | b3122659 |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | Lai, PT | - |
| dc.contributor.author | Or, Chin-tung, David. | - |
| dc.contributor.author | 柯展東 | - |
| dc.date.issued | 2002 | - |
| dc.identifier.citation | Or, C. D. [柯展東]. (2002). Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b3122659 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/33659 | - |
| dc.language | eng | - |
| dc.publisher | The University of Hong Kong (Pokfulam, Hong Kong) | - |
| dc.relation.ispartof | HKU Theses Online (HKUTO) | - |
| dc.rights | The author retains all proprietary rights, (such as patent rights) and the right to use in future works. | - |
| dc.rights | This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License. | - |
| dc.source.uri | http://hub.hku.hk/bib/B31226590 | - |
| dc.subject.lcsh | Thin film transistors. | - |
| dc.subject.lcsh | Dielectrics. | - |
| dc.title | Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation | - |
| dc.type | PG_Thesis | - |
| dc.identifier.hkul | b3122659 | - |
| dc.description.thesisname | Master of Philosophy | - |
| dc.description.thesislevel | Master | - |
| dc.description.thesisdiscipline | Electrical and Electronic Engineering | - |
| dc.description.nature | published_or_final_version | - |
| dc.identifier.doi | 10.5353/th_b3122659 | - |
| dc.date.hkucongregation | 2002 | - |
| dc.identifier.mmsid | 991012305959703414 | - |