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Article: Effect of substrate temperature on the surface and interface oxidation of NiTi thin films

TitleEffect of substrate temperature on the surface and interface oxidation of NiTi thin films
Authors
KeywordsInterface
NiTi thin film
Surface
X-ray diffraction
X-ray photoelectron spectroscopy
Issue Date2006
Citation
Journal of Electron Spectroscopy and Related Phenomena, 2006, v. 151, n. 2, p. 144-148 How to Cite?
AbstractNiTi shape memory alloy thin films are deposited on pure Cu substrate at substrate ambient temperatures of 300 °C and 450 °C. The surface and interface oxidation of NiTi thin films are characterized by X-ray photoelectron spectroscopy (XPS). After a subsequent annealing treatment the crystallization behavior of the films deposited on substrate at different temperatures is studied by X-ray diffraction (XRD). The effects of substrate temperature on the surface and interface oxidation of NiTi thin films are investigated. In the film surface this is an oxide layer composed of TiO2. The Ni atom has not been detected on surface. In the film/substrate interface there is an oxide layer with a mixture Ti2O3 and NiO in the films deposited at substrate temperatures 300 °C and 450 °C. In the films deposited at ambient temperature, the interface layer contains Ti suboxides (TiO) and metallic Ni. © 2005 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/335734
ISSN
2023 Impact Factor: 1.8
2023 SCImago Journal Rankings: 0.506
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLi, Y. H.-
dc.contributor.authorLi, L. M.-
dc.contributor.authorMeng, F. L.-
dc.contributor.authorZheng, W. T.-
dc.contributor.authorZhao, J.-
dc.contributor.authorWang, Y. M.-
dc.date.accessioned2023-12-28T08:48:21Z-
dc.date.available2023-12-28T08:48:21Z-
dc.date.issued2006-
dc.identifier.citationJournal of Electron Spectroscopy and Related Phenomena, 2006, v. 151, n. 2, p. 144-148-
dc.identifier.issn0368-2048-
dc.identifier.urihttp://hdl.handle.net/10722/335734-
dc.description.abstractNiTi shape memory alloy thin films are deposited on pure Cu substrate at substrate ambient temperatures of 300 °C and 450 °C. The surface and interface oxidation of NiTi thin films are characterized by X-ray photoelectron spectroscopy (XPS). After a subsequent annealing treatment the crystallization behavior of the films deposited on substrate at different temperatures is studied by X-ray diffraction (XRD). The effects of substrate temperature on the surface and interface oxidation of NiTi thin films are investigated. In the film surface this is an oxide layer composed of TiO2. The Ni atom has not been detected on surface. In the film/substrate interface there is an oxide layer with a mixture Ti2O3 and NiO in the films deposited at substrate temperatures 300 °C and 450 °C. In the films deposited at ambient temperature, the interface layer contains Ti suboxides (TiO) and metallic Ni. © 2005 Elsevier B.V. All rights reserved.-
dc.languageeng-
dc.relation.ispartofJournal of Electron Spectroscopy and Related Phenomena-
dc.subjectInterface-
dc.subjectNiTi thin film-
dc.subjectSurface-
dc.subjectX-ray diffraction-
dc.subjectX-ray photoelectron spectroscopy-
dc.titleEffect of substrate temperature on the surface and interface oxidation of NiTi thin films-
dc.typeArticle-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.elspec.2005.11.009-
dc.identifier.scopuseid_2-s2.0-33244456142-
dc.identifier.volume151-
dc.identifier.issue2-
dc.identifier.spage144-
dc.identifier.epage148-
dc.identifier.isiWOS:000236057000009-

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