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Article: Effect of solution treatment on dislocation density in NiTi thin films
Title | Effect of solution treatment on dislocation density in NiTi thin films |
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Authors | |
Keywords | Dislocation density NiTi thin film Solution treatment X-ray diffraction profile Fourier analysis |
Issue Date | 2004 |
Citation | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2004, v. 33, n. 11, p. 1136-1139 How to Cite? |
Abstract | The NiTi thin films were sputter-deposited on Cu foil. The thin films subjected to solution treatment at 800°C for 30 min; 45 min; 60 min and 120 min. X-ray diffraction profile Fourier analysis have been used to study the variation of the dislocation density and the dislocation distribution parameters during solution treatment. It has been found that the average dislocation density decreases and the coherent domain size gradually increases with the increase of solution treating time. The average dislocation distribution parameters are unchanged as the average dislocation density decreases. Microhardness was calculated from the dislocation data. The results show that the microhardness values are not in a good agreement between calculated values and measured values. |
Persistent Identifier | http://hdl.handle.net/10722/335728 |
ISSN | 2023 Impact Factor: 0.6 2023 SCImago Journal Rankings: 0.204 |
DC Field | Value | Language |
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dc.contributor.author | Li, Yonghua | - |
dc.contributor.author | Meng, Fanling | - |
dc.contributor.author | Gao, Zhongmin | - |
dc.contributor.author | Zheng, Weitao | - |
dc.contributor.author | Wang, Yuming | - |
dc.date.accessioned | 2023-12-28T08:48:18Z | - |
dc.date.available | 2023-12-28T08:48:18Z | - |
dc.date.issued | 2004 | - |
dc.identifier.citation | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2004, v. 33, n. 11, p. 1136-1139 | - |
dc.identifier.issn | 1002-185X | - |
dc.identifier.uri | http://hdl.handle.net/10722/335728 | - |
dc.description.abstract | The NiTi thin films were sputter-deposited on Cu foil. The thin films subjected to solution treatment at 800°C for 30 min; 45 min; 60 min and 120 min. X-ray diffraction profile Fourier analysis have been used to study the variation of the dislocation density and the dislocation distribution parameters during solution treatment. It has been found that the average dislocation density decreases and the coherent domain size gradually increases with the increase of solution treating time. The average dislocation distribution parameters are unchanged as the average dislocation density decreases. Microhardness was calculated from the dislocation data. The results show that the microhardness values are not in a good agreement between calculated values and measured values. | - |
dc.language | eng | - |
dc.relation.ispartof | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | - |
dc.subject | Dislocation density | - |
dc.subject | NiTi thin film | - |
dc.subject | Solution treatment | - |
dc.subject | X-ray diffraction profile Fourier analysis | - |
dc.title | Effect of solution treatment on dislocation density in NiTi thin films | - |
dc.type | Article | - |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.scopus | eid_2-s2.0-11144221659 | - |
dc.identifier.volume | 33 | - |
dc.identifier.issue | 11 | - |
dc.identifier.spage | 1136 | - |
dc.identifier.epage | 1139 | - |